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Multiband plasma-process monitor C10346-01 C10346-01 is a multiband plasma process monitor designed for real-time, monitoring of wide spectrum.
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Monitoring Plasma (Emission Spectrum) in Real-Time C10346-01 is a monitoring system to detect wide spectrum plasma emission during the process of etching, spattering and CVD in semiconductor manufacturing . With the various analysis functions, it can be used for setting up end-point detection conditions and automatic detection of etching and cleaning, estimation of plasma species and monitoring (plasma) contamination and abnormal discharges. Features Simultaneous measurements of wide (plasma) spectrum Easy measurement using optical fibers Real-time plasma (emission) measurement Operation...
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Instantly measures different types of radicals and ions in plasma Plasma Etching Deep-RIE DLC Coating RIE Plasma Surface Treatment Plasma CVD Plasma Ashing Sputtering Other Processes Using Plasma Standard system configuration Optical fiber probe Multiband plasma-process monitor C10346-01 Multiband plasma process SIGNAL INPUT Main unit Data acquisition software U9046 (Windows 7,10) Multiband plasma process monitor control computer Easy parameter evaluations to detect etching and cleaning endpoints Optimal conditions or triggers used for defining endpoints can be set for individual process by...
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A host of user-friendly measurement functions Data measurement Script programming Measurement parameter evaluations (maximum measurement time, exposure time, number of integration) Manual measurement start / stop (start / stop by manual operation) Trigger to start automatic measurement (light intensity level, external TTL signal) Spectrum monitoring and automatic judgment according to measurement and detection conditions in script Four arithmetic operations of spectrum (difference of spectrum / ratio of spectrum etc...) Spectrum normalization Processing using primary and differential (first...
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Operation with multiple chambers Single chamber configuration Plasma process unit Optical fiber probe Loader Chamber Multiband plasma-process monitor C10346-01 multiband plasma process Data acquisition software U9046 SIGNAL INPUT Un loader Multiband plasma process monitor control computer Start input Busy output Digital output Analog output Single chamber configuration (SMT drive software) Plasma process unit Loader Chamber Optical fiber probe Multiband plasma-process monitor C10346-01 C10346 multiband plasma process SIGNAL INPUT Switch measurement recipe Start measurement Endpoint...
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Standard software Data acquisition software U9046 Configuration SMT driver Connection with external unit Watchdog Monitoring of each component Protocol Monitoring of event Communication layer Stores emission spectrum database acquired during the multiband plasma process into a database ! Multiband Plasma-Process Monitor Multiband Plasma-Process Monitor Multiband Plasma-Process Monitor Multiband Plasma-Process Monitor Control station Measurement control Database tool Database management The data acquisition software U9046 is software that simultaneously controls up to four the multiband...
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Software that extracts full performance from the multiband plasma process SMT driver The data acquisition software U9046 communicates with other software through a Microsoft COM interface. Intermediate software created for Microsoft COM interface and other interfaces (RS-232C, Ethernet, etc.) allows the U9046 to communicate with external units. This type of intermediate software for the U9046 is referred to as an SMT driver. The U9046 comes with an SMT driver sample program that was created with Visual Basic. Modifying this sample program allows the user to easily create an SMT driver that...
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Option Software End point synthesis tool U8851 Overview Spectrum data acquired with a multiband plasma process monitor can be considered the sum of various spectral components including gas spectra and reaction product spectra. The U8851 analyzes the spectral components at each time and then extracts the spectral components which are newly generated at the endpoints. Endpoints are detected based on time-course changes in these spectral components. This makes it possible to detect an endpoint while making effective use of a wide spectral range. This is highly accurate detection compared to...
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Highly accurate endpoint detection in plasma etching Analysis examples Optimizing the CVD cleaning (CF4, O2) after depositing SiN (SiH4, NH3, N2, Ar) film. The U8851 includes a library of typical material emission wavelengths that allows analyzing what materials have produced the acquired spectral components. In this example, N2, O and F line spectra appear on spectral components generated at the cleaning endpoint. The N2 spectral intensity can here be observed to decrease at the endpoint while the O and F spectral intensities increase. This analysis can be simultaneously performed on two...
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Option Software Analysis and fault detection tool U9275 Overview As mentioned in the U8851 description, spectrum data acquired with a multiband plasma process monitor can be considered the sum of various spectral components including gas spectra and reaction product spectra. The U9275 finds statistical values such as mean and maximum relative to time-course changes in the spectral components being monitored, and assigns them key numbers. A normal range for each key number is also set. If a value exceeding that range is found, it is treated as a fault. By selecting a calculation method for...
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Real-time detection of process faults such as leaks and contaminations AFDT driver The analysis and fault detection tool U9275 communicates with other software through a Microsoft COM interface. Intermediate software created for the Microsoft COM interface and other interfaces (RS-232C, Ethernet, etc.) allows the U9275 to communicate with external units. This type of intermediate software for the U9275 is referred to as an AFDT driver. The U9275 comes with an AFDT driver sample program that was created with Visual Basic. Modifying this sample program allows the user to easily create an AFDT...
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