Unique ImmJET™ Wafer Processing The WaferStorm® Platform Metal Lift-Off > Heated immersion tank > High-pressure spray chamber > Lift-off material filtration system > High-pressure flow monitoring > Low chemical consumption Photoresist/Dry Photoresist/Dry Film Resist Strip > Heated, recirculating, solvent immersion tank tank > > > High-pressure spray up to 3000 psi psi > HPC needle-and HPC fan-spray modes needle and HPC fan-spray modes > > Flow rate monitoring system > Flow rate monitoring system > Low chemical consumption > Low chemical consumption TSV Clean, Post-Etch Residue Removal > Heated immersion tank > High-pressure spray chamber > Low chemical consumption Flux Clean > Complete flux removal > High yield

WaferStorm is a solvent-based platform, available in cutomizable configurations. All WaferStorm systems are based on Veeco's unique ImmJET technology, which provides improved performance at lower cost of ownership when compared with conventional wet-bench-only or spray-only approaches. The process combines equal soak time in the wet buffer tank for each wafer, followed by spray, and then a final step depending on the process being performed. This unique combination minimizes both spray time and chemistry use, and adds a significant level of control during wafer processing. The reduction in spray...