Catalog excerpts
Veeco Nova ULTRA High Temperature Substrate Heater Push your reasearch to new limits with Veeco's Nova™ ultra-high temperature substrate heater. Our novel design allows customers to reach temperatures and new growth regimes inaccessible a few years ago. This heater is capable of 1850°C thermocouple tem- perature and can heat a full 3" wafer. The hot zone, constructed entirely of refractory metals, ensures clean operation in ultra-high vacuum. Additionally, an integrated water cooling enclosure thermally isolates the heater, minimizing the impact to the rest of the chamber. These features make the Nova heater ideal for "hot" research areas including graphene, novel nitride, and boron nitride applications. Optical view of Veeco's Nova Veeco's new Nova heater heater with platen model rendition • Special graphite and tungsten platens for various substrate sizes • Field serviceable filaments • 0-30 rotations per minute speed • Water-cooled enclosure • Available exclusively on Veeco's For the latest research achievements conducted with this product, check out the paper from the researchers at the University of Nottingham: "High temperature MBE of graphene on sapphire and hexagonal boron nitride flakes on sapphire"
Open the catalog to page 1All VEECO catalogs and technical brochures
-
Quest OMS
2 Pages
-
SPECTOR-HT
2 Pages
-
Apex Gas Mixing Solution
2 Pages
-
Ammonia Resistant Components
2 Pages
-
GENxplor R&D MBE System
2 Pages
-
5cc Dual Dopant Source
2 Pages
-
GENxplor™
2 Pages
-
K465i
2 Pages
-
The WaferStorm® Platform
2 Pages
-
The WaferEtch® Platform
2 Pages
-
PROPEL Power GaN
2 Pages
-
TurboDisc® K475i™ As/P
2 Pages
-
TurboDisc GaN
1 Pages
-
Low Temperature SUMO Source
4 Pages
-
Valved Cracker for Sulfur
4 Pages
-
Valved Cracker for Selenium
4 Pages
-
Single Filament Source
3 Pages
-
Valved Cracker for Arsenic
4 Pages
-
High Temperature Source
4 Pages
-
Solutions for Carbon Doping
2 Pages
-
Phosphorus Recovery System
2 Pages
-
Gas Source Delivery System
2 Pages