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TurboDisc® K475i™ As/P

TurboDisc® K475i™ As/P

TurboDisc® K475i™ As/P

Product catalog summary
Introduction
The document introduces the TurboDisc K475i As/P MOCVD System, designed for high-volume LED production, offering the highest productivity and lowest cost of ownership in the industry. It is particularly effective for producing red, orange, and yellow LEDs, as well as multi-junction III-V solar cells, laser diodes, and transistors.
Key Features
  • Uniform FlowFlange Technology: This new technology ensures best-in-class uniformity and process repeatability, leading to greater yields and reduced particle generation.
  • Robust Reactor Design: The design allows for ease-of-use, faster recovery after maintenance, and maximum uptime, contributing to high productivity.
  • High Throughput and Low Costs: The system offers high growth rates and low consumable costs, resulting in the industry's lowest cost of ownership.
Technical Specifications
  • Uniformity and Repeatability: The system achieves excellent uniformity and repeatability, with improved wavelength uniformity for greater yield.
  • Ease of Maintenance: Fast recovery after maintenance and easy tuning capabilities enhance operational efficiency.
  • Wafer Size Transition: Seamless transition from 15x4” to 7x6” wafer sizes, with upgradability from previous K tool platforms.
Performance Metrics
  • Distributed Bragg Reflector (DBR) Wavelength Uniformity: Average inner wafer wavelength is 633 nm with 0.3% uniformity, and average outer wafer wavelength is 634 nm with 0.4% uniformity.
Conclusion
The TurboDisc K475i As/P MOCVD System stands out for its unmatched uniformity advancements, ease-of-use, and flexibility, making it a leading choice for high-volume LED production.
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Catalog excerpts

TurboDisc® K475i™ As/P-1

Introducing the LED Industry’s Highest Productivity As/P MOCVD System with the Best-in-Class Yields TurboDisc® K475i™ As/P MOCVD System for LED Production Industry’s Highest Productivity and Lowest Cost of Ownership MOCVD System for High Volume LED Production > New Uniform FlowFlange™ technology enables best-in-class uniformity and process repeatability capable of driving greater yields > Robust reactor design provides ease-of-use and faster recovery after maintenance for maximum uptime > Industry’s highest productivity due to high growth rates and maximum uptime > Low consumable costs and industry’s highest throughput provide industry’s lowest cost

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TurboDisc® K475i™ As/P-2

Unmatched Uniformity Advancements Veeco’s new TurboDisc K475i As/P MOCVD System is the industry’s best reactor for the production of red, orange, yellow (R/O/Y) LEDs, as well as multi-junction III-V solar cells, laser diodes and transistors. The K475i system features a new reactor design incorporating Veeco’s Uniform FlowFlange technology producing films with very high uniformity and improved withinwafer and wafer-to-wafer repeatability with the industry’s lowest particle generation. The simple design of the Uniform FlowFlange technology provides ease-of-tuning for fast process optimization and...

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