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TurboDisc GaN
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TurboDisc GaN

TurboDisc GaN
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TurboDisc GaN-1

TurboDisc CaN MOCVD System Comparison "LED manufacturing is very competitive due to industry consolidation and the decreasing price of LED bulbs. I am under pressure to lower manufacturing costs to protect my gross margins while adding capacity to my fab. We are running at about 90% capacity right now and need to add capacity to meet accelerating demand for general lighting adoption. Therefore, we need high productivity, high yield and reliable MOCVD systems." TurboDisc9 MOCVD Product Release Timeline for improved flow distribution Enhanced uniformity and yield MaxBright* Multi-Reactor MOCVD System chamber configuration > Central robot to transfer wafer carriers > Modular frame and shared > Nexus control software > Up to 20% cost per wafer reduction compared to previous generations > Best-in-class uniformity drives > Highest productivity reactor generates 2.5x throughput advantage compared > Seamless process transfer from existing TurboDisc MOCVD systems Find out more at www.veeco.com/mocvd Veeco MOCVD 145 Belmont Drive | Somerset, NJ 08873 ©2014 Veeco Instruments Inc. All rights reserved. Veeco, TurboDisc, EPIK700 MaxBright, K4E5I and FlowFlange are trademarks of Veeco Instruments Inc. Patents pending. Veeco reserves the right to change specifications and other product information without notice. Printed in USA 8/2014. Innovation. Performance Brilliant.

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