Catalog excerpts
Another breakthrough from Veeco. This time it’s EPIK. Introducing the new TurboDisc EPIK700 MOCVD System September 4, 2014 1 | Introducing TurboDisc EPIK700 GaN MOCVD System Brighter World. Better Future
Open the catalog to page 1EPIK700 Raises the Bar TO A NEW LEVEL of Productivity and Yield to Maximize Customers’ Profitability 2014 EPIK700 Extends Veeco’s Leadership MaxBright Becomes Market Leading MOCVD System K465i Becomes Market Leading MOCVD System Highest productivity MOCVD platform with up to 20% improved CoO #1 selling MOCVD tool Best in class yield #1 selling MOCVD tool Compact cluster architecture Leader in yield and productivity MaxBright is yield and productivity leader Fastest to production with easy process transfer Most efficient capital investment for maximum profitability
Open the catalog to page 2EPIK700 to Drive LED Bulb Cost Roadmap Lower EPIK700 • • Best in class yield Highest productivity 2012 DOE LED Bulb ASP Roadmap Actual LED Bulb ASP Trend Note: Actual LED Bulb ASP may vary depending on customer use cases and region. 3 | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instru
Open the catalog to page 3LED Industry’s Highest Productivity and Lowest Cost of Ownership MOCVD System Highest productivity MOCVD platform with up to 20% improved CoO compared to previous generations Designed for best-in-class uniformity which provides greater wafer yield Fastest to production with easy process transfer Most efficient capital investment for maximum profitability EPIK700 Significantly Lowers Customers’ Costs Per Wafer | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instruments In
Open the catalog to page 4EPIK700 Maximizes Productivity Key innovations: Larger Capacity 31x4” 12x6” AcuRampTM Advanced Temperature Control Improved Serviceability Advanced Automation | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instruments In
Open the catalog to page 5Best-in-Class Uniformity with Key Innovations Key innovations: IsoFlangeTM Technology Improved flow uniformity TruHeatTM Technology Improved temperature uniformity | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instruments Inc.
Open the catalog to page 6Capacity Increase Improves Throughput Wafer carrier capacity increase Veeco Reactor Generation Timeline | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instruments Inc.
Open the catalog to page 7EPIK700 Difference – Up to 20% CoO Advantage Yielded throughput Capital efficiency Footprint efficiency | Introducing TurboDisc EPIK700 GaN MOCVD System Copyright ©2014 Veeco Instruments Inc.
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