Oxygen Resistant * Extended life sources oxygen environments • SUMO® crucible available with optimal minimized depletion Oxide material research has increased considerably over the years because of its importance in the IC industry and because of the wide variety of electronic and optical properties made possible using these materials. Due to the corrosive nature of oxygen, performing thin-film research in an oxygen environment often presents equipment challenges. For example, it is common to thermally evaporate materials in an oxygen environment of 1 0"5 Torr or higher while maintaining the substrate temperature at 800°C. The high oxygen partial pressure and temperature greatly reduces the lifetime of the heating elements in effusion cells and substrate heaters. As a result, the equipment uptime is compromised, leading to shorter compaign lengths and high repair costs. Using special oxygen-resistant materials as opposed to traditional materials such as Mo and Ta, it is now possible to operate Veeco's innovative and proven sources and substrate heaters in high oxygen partial pressure environments. Oxygen-resistant sources are currently available from Veeco for temperatures up to 1 150°C with oxygen partial pressures as high as 5 milliTorr. Substrate heaters are also available for temperatures up to 800°C and oxygen partial pressures of Substrate Heater Product Specifications

Source Product Specifications * SUMO capacity designates maximum useful capacity. Other crucible capacity based on total volume, but not recommended filling capacity. ** PBN crucible. Other materials available upon request (i.e., alumina, BeO and sapphire). Solutions for a nanoscale world.™ Compound Semiconductor • MBE Operations 4900 Constellation Drive, St. Paul, MN 55127 USA © 2006 Veeco Instruments Inc. All rights rese^ed. (1 2-06B) SUMO is o registered trademark, and Veeco and Solutions for o nonoscole world ore trademarks of Veeco.