Catalog excerpts
Single Filament Source 1 6cc Low Temperature Single Filament Source. The Low Temperature Single Filament Source provides stable and consistent fluxes of high vapor pressure materials. Its performance below 750°C surpasses conventional sources because of its low thermal mass. The source is enclosed in a heat-shielding package designed for optimal source responsiveness and stability in the Temperature stability is critical with high vapor pressure materials, since even a small temperature variation produces a dramatic This source features a modified single filament design. It achieves hot-lip heating with a filament that uniformly heats the bottom portion of the crucible but includes extra filament density at the top to compensate for radiative heat loss at the orifice. Hot-lip heating eliminates material recondensation at the crucible orifice, which can lead to source occlusion and beam • Largest capacity • Shutter transients virtually material quality • Uniformity depends on fill level and crucible shape • Shutter transients reduced material quality • Uniformity depends on fill level and crucible shape • Shutter transients may exist material quality In comparison/ the SUMO Source is the best available source for non-valved evaporation of high vapor pressure materials. The Low Temperature Single Filament Source offers good performance and value for general purpose applications. For demanding applications, or when large source capacities are required, a Low Temperature Dual Filament or Low Temperature SUMO® Source is recommended. * Cost-effective solution evaporation with * Single filament hot-lip crucible orifice • Proven performance * Compatible with most
Open the catalog to page 1Veeco Low Temperature Single Filament Source and PBN crucible after use as an Sb source for 175 microns of AlGaSb growth. Note the absence of condensation in the crucible. The source was not outgassed or otherwise heated above normal operting temperatures prior to removal from the system. Temperature stability is demonstrated in evaporating organic compounds. Performance and Benefits The Low Temperature Single Filament Source is precisely tailored to the demands of evaporating high vapor pressure materials. Benefits include: • Optimal performance at lower operating temperatures • Rapid flux...
Open the catalog to page 2Product Specifications Source Characteristics Charge Materials Recommended for use with high vapor pressure materials typically evaporated or sublimed in the 100-750°C range Crucible Shape Conical Straight-wall Minimum Mounting Flange Size Filament Type Ta wire heater filament, PBN supports Thermocouple Type Type K (Chromel/Alumel). One patented band thermocouple In-Vacuum Length Typical Operating Temperature Maximum Outgassing Temperature Power Requirements for Varies with source size. Contact Veeco Maximum Temperature (W/A) Water-Cooling Optional cooling coil Power Supply One Veeco...
Open the catalog to page 3Selection Guide Typical Source Commonly Used Indicated by “X” System 1cc GEN II™ Perkin-Elmer Other Veeco sources are also available for use on systems from Eiko, Anelva, Ulvac, SVTA, and DCA, as well as custom chambers. Contact Veeco for details. Solutions for a nanoscale world.™ Compound Semiconductor • MBE Operations 4900 Constellation Drive, St. Paul, MN 55127 USA Phone: (651) 482-0800, Fax: (651) 482-0600 www.veeco.com/mbe © 2009 Veeco Instruments Inc. All rights reserved. (6-09) SUMO, GEN200 and GEN2000 are registered trademarks and GEN II, GEN III, GEN930, GEN10, GEN20 and Solutions...
Open the catalog to page 4All VEECO catalogs and technical brochures
-
Quest OMS
2 Pages
-
SPECTOR-HT
2 Pages
-
Apex Gas Mixing Solution
2 Pages
-
Ammonia Resistant Components
2 Pages
-
GENxplor R&D MBE System
2 Pages
-
5cc Dual Dopant Source
2 Pages
-
GENxplor™
2 Pages
-
K465i
2 Pages
-
The WaferStorm® Platform
2 Pages
-
The WaferEtch® Platform
2 Pages
-
PROPEL Power GaN
2 Pages
-
TurboDisc® K475i™ As/P
2 Pages
-
TurboDisc GaN
1 Pages
-
Low Temperature SUMO Source
4 Pages
-
Valved Cracker for Sulfur
4 Pages
-
Valved Cracker for Selenium
4 Pages
-
Single Filament Source
3 Pages
-
Valved Cracker for Arsenic
4 Pages
-
High Temperature Source
4 Pages
-
Solutions for Carbon Doping
2 Pages
-
Phosphorus Recovery System
2 Pages
-
Gas Source Delivery System
2 Pages