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GENxplor R&D MBE System

GENxplor R&D MBE System
2Pages

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Industry's First Fully-Integrated MBE System for the Compound Semiconductor R&D Market • High quality epitaxial layers on substrates • Unique, single frame architecture improves installation time, provides convenient access to effusion cells and allows easier serviceability • Efficient, all-in-one design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than other • Ideal for cutting edge research on a wide variety of materials including GaAs, nitrides and oxides • Molly® software integrates easy recipe writing, automated growth control, and always-on data recording • Winner of the CSindustry award for compound semiconductor manufacturing • Extreme high temperature heater (>1850°C) • Multiple E-beam source deposition • Wafer holder exchange and/or flip • Retractable sources System Integration: • Isolated preparation chamber • Multi-system with dissimilar materials • Veeco legacy systems (GENII/GEN930) • Atomic Layer Deposition

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The compound semiconductor R&D community asked for a more affordable, flexible, and easy-to-use MBE system and Veeco has delivered with the GENxplor™. The GENxplor, awarded the the CSindustry award for compound semiconductor manufacturing, uses Veeco's proven 3" growth chamber design and features unmatched process flexibility - perfect for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells and high-temperature superconductors. Its efficient, single frame design combines all vacuum hardware with on-board electronics to make it up to 40% smaller than...

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GENxplor R&D MBE System 2Pages

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GENxplor R&D MBE System
2Pages