Transfer Valve / Insert L-MOTION Series 04.3 / 05.3 for corrosive semiconductor processes and loadlock applications First REAL L-MOTION valve on the market High speed with virtually no shock Excellent gate seal lifetime Highest yield through low particle count Quick and simple maintenance ready for 450 mm wafer technology

Transfer Valve / Insert L-MOTION L-motion closing movement • Dedicated for 200, 300 and 450 mm semi-  conductor processes • Especially designed for corrosive process environment such as Etch and CVD • Reliable actuator with integrated, mechanically triggered sequence control • Fully protected bellows feedthrough • Gate with optimized seal shapes • Uniform seal compression • Adjustable closing force for different elastomers • Pneumatically locked in closed and open position open Benefits • Excellent gate seal lifetime in corrosive processes 1 service cover 2 service cover seal 3 body seal closed,...

Series 04.3 / 05.3 Options • Different opening sizes • Surface treatment aluminum hard anodized, Ni plated • Different sealing materials Fluoroelastomers (FKM) Perfluoroelastomers (FFKM)  Silicone (VMQ, FVMQ) • Gate seal standard: vulcanized (1) option: O-ring (2) • Heated / cooled versions (2) O-ring seal  (option) (1) vulcanized seal  (standard) Dimensions Valve Series 043: seat side Valve Series 043: rear side a valve seat side b compressed air connection c electrical connection f position indicator

Transfer Valve / Insert L-MOTION Technical data Leak rate 1) at body and at seat in mbar Is-1 FKM seal sealing surface metal blank (milled / ball polished) FFKM seal body metal seal aluminum: hard anodized aluminum: nickel-plated Measuring conditions: Body: 30s, He conc. ≥ 20%  Seat: 15s, He conc. ≥ 30% < 5 × 10 -10 (stainless  steel only) Automatic leak rate supervision   dp = 1 bar Pressure range  – Metal blank or nickel-plated – Aluminum, hard anodized – Metal seal Differential pressure on the gate Differential pressure at opening ≤ 30 mbar in either direction Actuator cycle life Temperature...