RTP-150-HV
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Model RTP-150-HV Rapid Thermal Process Oven with High Vacuum up to 150 mm dia. or 156 mm x 156 mm substrate size  For wafer size up to 150 mm dia.  Ramp up rate up to 150 K/sec  Control SIMATIC® with 7" touch panel  7" touch panel -6  Vacuum up to 10 hPa  Process gas line with MFC for N2 Picture similar - Technical and design changes reserved Precise fast ramp up and fast ramp down rates Implantation/Contact Annealing Operation with inert gases, Oxygen, Hydrogen, Forming gas Excellent temperature uniformity Integrated data logging SiAu, SiAl, SiMo Alloying Heated by Infrared Lamps 50 programs with 50 steps each Crystallization & densification Small foot print Si-Solar Wafer Cells on glass by Si-Wafer bonding UniTemp GmbH Luitpoldstr. 6 85276 Pfaffenhofen/Ilm

Rapid Thermal Annealing Process Oven with vacuum Touch Panel Svivel Programmable temperature profiles Record of process data Process in different gas atmospheres The RTP-150-HV Rapid Thermal Annealing Process Oven is an excellent tool for various semiconductor up to 150 mm diameter wafer or 156 mm x 156 mm s u b s t r a t e s i z e . The system is vacuum capable of up to 10-6 hPa and will be delivered with a turbomolecular pump. The cooling of the parts in the quartz chamber is realized by Nitrogen gas which will be led through the chamber. For chamber cooling we recommend a closed loop...

Chamber material Quartz glass Part holder Quartz universal holder for either 156 x 156 mm solar wafer or 150 mm wafer dia. Chamber height Vacuum capability Up to 10-6 hPa (incl. turbomolecular pump) Process chamber size Temp. unifomity Top and bottom heating with 24 IR Lamps (21 kW) Ramp down rate Flow Controller Mass Flow Controller (Nitrogen 5 nlm = norm liter per minute) SIMATIC®; 50 programs with 50 steps Chamber cooling Water cooled Substrate Cooling Electrical connection UniTemp GmbH Luitpoldstr. 6 85276 Pfaffenhofen/Ilm info@unitemp.de www.unite

Unlvrrul frn|)iiri: jr* Procrnri RTP-H2 Hydrogen option with Safety device (Sensor and Hydrogen monitoring) RTP-H2S Safety device for Hydrogen option (with cover and sensor) RTP-MFC Additional process gas line with Mass Flow Controller (max. 3 add) * RTP-Ox Oxygen Analyser to measure Oxygen residues (not in combination with Hydrogen Option) RTP-MM Moisture Analyzer to measure moisture residues in the chamber RTP-SW Switchbox for chiller and vacuum pump RTP-TC add. Thermocouple to measure on device (plugged in chamber, max. 1) RTP-VCR Tubing made of VCR (welded) RTP-GP-150 Graphite Plate or...