Model RTP-100
4Pages

Model RTP-100 Vacuum capable Rapid Thermal Process oven for single wafer up to 4“ (100mm diameter wafer) or 100mm x 100mm substrate size 14.5 cm touch screen display for process control RTP-100 Automatic opening and closing of chamber Features: • Fast ramp up rates up to 150 K/sec • Vacuum or inert gas atmosphere • Up to 100 mm wafer size • Up to 4 gas lines • Gases: N2, O2, N2/H2, Ar • 14.5 cm touch screen display • Automatic opening and closing of chamber UniTemp GmbH Senefelder Straße 9 D-85276 Pfaffenhofen Applications: • Annealing • Rapid Thermal Processes • SiAu, SiAl, SiMo alloying • Low k dielectrica • Post implanting annealing • • • Si-Solar Wafer Cells on glass by Si wafer bonding info@unitemp.de www.unitemp.de

Model RTP-100 • Rapid thermal annealing ovens • • • • • Record of process data (.csv / .xls) Windows based software (UniSoft-SPS) SPS controller Process in gas atmosphere or vacuum Small required space The Rapid Thermal Process oven series is an excellent tool for various semiconductor processes and single wafer processing up to 100 mm wafer size. Some examples for applications: Laboratory furnace for all kind of developers implementing and researching new processes, prototype research, environmental research purposes and for small pre-series or series. The oven is designed in a modular...

Chamber material Quartz glass chamber Chamber height Loading system Quartz glass tray Vacuum capability Up to 10-3 hPa including vacuum measurement up to 1 hPa Process chamber size Temp. unifomity Heating zones Top and bottom heating Top heating is programmable and can be switched off during process Better than 150 K/sec Ramp down rate Water cooled Inlet pressure water Dimension oven (19.4“ x 19.84“ x 17.32“ including display mounted on the top) 12 programs storable each with 32 steps Electrical connection UniTemp GmbH Technical changes reserved. Senefelder Straße 9 D-85276 Pfaffenhofen...

Options and accessories: FM-EL FM-MFC Additional gas line with Mass Flow Controller (max. 2) Maximum 4 gas lines, thereof maximum 2 with MFCs Upgrade from FM-EL to FM-MFC Membrane pump for vacuum up to 10 hPa with manometer Rotary vane pump for vacuum up to 10-3 Turbomolecular pump system for vacuum up to 10-6 hPa Preparation for high vacuum up to 10-6 hPa with gate valve and vacuum measurement Graphite plate or susceptor Additional 100 mm oven chamber (double-chamber) for usage of 2 chambers and 1 controller in one rack; no simultaneous operation of both chambers Spare quartz chamber for...