TruPlasma RF Series 1000 / 3000

Product catalog summary

Overview
The TruPlasma RF Series 1000 / 3000 by TRUMPF Hüttinger is designed to provide stable RF power for PECVD processes, ensuring high productivity and consistent results in semiconductor applications, photovoltaic, and surface treatment processes. It is particularly effective in film deposition and dry etching processes.

Key Features

High output stability and operational reliability.
Phase shift regulation for precise process control at both high and low power levels.
Combine Line technology for robust power supply, even with plasma fluctuations.
Efficiency factor of over 80% to reduce operational costs.
Available in 1, 2, or 3 kW output power, operating at 13.56 MHz.
Compact design for easy integration into film deposition tools.
True 50 Ohm output impedance for flexible cable length selection.

Benefits

Reduces operational costs.
Ensures maximum system uptime.
Provides stable processes for optimal productivity.
High reproducibility of process results.
Easy and cost-efficient integration into existing systems.

Technical Specifications

Cooling System: Water cooling with a minimum flow rate of 4.0 l/min and temperature range of 5°C – 35°C.
Interfaces: Analog (0 – 10 VDC), Digital (PROFIBUS, RS 232 / RS 485, DeviceNet).
Dimensions: 216 mm x 133 mm x 381 mm; Weight: 17 kg.
Protection Class: IP 40; Certifications: CE, SEMI S2, SEMI F47.
Output Power: 1 kW, 2 kW, 3 kW; Min. Output Power: 1 W.
Operating Frequency: 13.56 MHz ± 0.005%.
Pulsed Operation: Pulse Frequency 10 Hz – 50 kHz, Duty Cycle 1% – 99%.
Input Parameters: Line Voltage 3 x 200 V ± 10%, Line Frequency 50 Hz / 60 Hz ± 3 Hz, Power Factor > 0.85.

Conclusion
The TruPlasma RF Series 1000 / 3000 is a highly efficient and reliable solution for RF plasma processes, offering significant benefits in terms of cost reduction, system uptime, and process stability. Its advanced technologies and robust design make it an ideal choice for demanding applications in semiconductor manufacturing and other related fields.

Catalog excerpts

Powering processes with unprecedented stability TruPlasma RF Series 1000 / 3000

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Stable RF power for best productivity in PECVD processes. TruPlasma RF Series 1000 / 3000. When it comes to film deposition in the manufacturing of complex micro-structures, process reproducibility is the key to consistent results. TRUMPF Hüttinger‘s TruPlasma RF Series 1000 / 3000 provides exceptionally power output stability and operational reliability. Designed with a focus on RF plasma processes in semiconductor applications, its features are also suited to ensure best results and productivity in photovoltaic and surface treatment processes. Typical applications include PECVD and PVD as well...

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Output Parameters Cooling Specifications Output Power Cooling System Reflected Power Limit (VSWR ∞) Min. Water Flow Rate Operating Frequency Cooling Water Temperature 3) The cooling water temperature must exceed the dew point of the ambient air. Pulsed Operation Parameters Pulse Frequency Duty Cycle Min. Pulse on Time Min. Pulse off Time Mains Input Connection Harting Han modular plug 30 A (male) Input Parameters Line Voltage Line Frequency Overall Efficiency (Line to Load)1 Protection Class 4) Either PROFIBUS or RS interface are available. 1) At full rated power. 2) In worst case mismatch situation....

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© TRUMPF Hüttinger GmbH + Co. KG, 2013. All rights reserved. Subject to errors and technical changes. 1575443 - V05 TRUMPF Hüttinger GmbH + Co. KG Bötzinger Straße 80 · 79111 Freiburg · Phone +49 761 8971-0 Fax +49 761 8971-1150 · E-Mail [email protected] Homepage www.trumpf-huettinger.com

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