TruPlasma RF Series 1000 / 3000
4Pages

Powering processes with unprecedented stability TruPlasma RF Series 1000 / 3000

Stable RF power for best productivity in PECVD processes. TruPlasma RF Series 1000 / 3000. When it comes to film deposition in the manufacturing of complex micro-structures, process reproducibility is the key to consistent results. TRUMPF Hüttinger‘s TruPlasma RF Series 1000 / 3000 provides exceptionally power output stability and operational reliability. Designed with a focus on RF plasma processes in semiconductor applications, its features are also suited to ensure best results and productivity in photovoltaic and surface treatment processes. Typical applications include PECVD and PVD as...

Output Parameters Cooling Specifications Output Power Cooling System Reflected Power Limit (VSWR ∞) Min. Water Flow Rate Operating Frequency Cooling Water Temperature 3) The cooling water temperature must exceed the dew point of the ambient air. Pulsed Operation Parameters Pulse Frequency Duty Cycle Min. Pulse on Time Min. Pulse off Time Mains Input Connection Harting Han modular plug 30 A (male) Input Parameters Line Voltage Line Frequency Overall Efficiency (Line to Load)1 Protection Class 4) Either PROFIBUS or RS interface are available. 1) At full rated power. 2) In worst case mismatch...

© TRUMPF Hüttinger GmbH + Co. KG, 2013. All rights reserved. Subject to errors and technical changes. 1575443 - V05 TRUMPF Hüttinger GmbH + Co. KG Bötzinger Straße 80 · 79111 Freiburg · Phone +49 761 8971-0 Fax +49 761 8971-1150 · E-Mail Info.Electronic@de.trumpf.com Homepage www.trumpf-huettinger.com