Plasma Excitation
16Pages

Process power from TRUMPF Hüttinger Generators for plasma excitation.

How we are putting plasma excitation to work. We can see it in lightning, the northern lights and the sun’s corona – fascinating examples of naturally occurring plasma phenomena. Sometimes called the Fourth State of Matter, plasma is created when gas is heated to an extremely high temperature, causing the kinetic energy of the gas particles to rise so much that electrons are released from the atoms and molecules. In nature, plasmas are self-igniting and highly unstable. Fortunately, scientists and engineers have figured out how to create sustained and precisely controlled plasmas for use in...

TRUMPF Hüttinger – the perfect development partner for plasma. Despite its many uses, plasma technology is still in its infancy. New applications are continuously being developed. TRUMPF Hüttinger is ready to work with you to find the optimal energy source you need for new or existing uses. TRUMPF Hüttinger’s DC, middle and radio frequency units already cover a wide range of applications. With our cost-effective, field-proven devices, customer-specific requirements can be accommodated with custom solutions that are based on our standard products. Sectors: Glass industry Photovoltaic...

Reaching new heights in flexibility. Providing customer solutions. Every day! DC generators from TRUMPF Hüttinger are built to perform in the harshest of industrial environments. Whether for hard coating tools on a factory floor or a flat panel fab cleanroom. Across the range, our generators don‘t compromise when it comes to accuracy, repeatability or arc suppression. Year after year, they deliver the energy needed to run your processes efficiently and effectively. But even better, DC generators from TRUMPF Hüttinger are modular and scalable. Individual blocks can be easily combined to...

Direct current (DC) TruPlasma DC Series 3000 / 4000 – the strong ones Versatile DC generators with high power density. Ideal for sophisticated DC plasma processes such as solar cell manufacturing. Can be combined to create high power stacks and are equipped with TRUMPF Hüttinger‘s advanced arc management system. Available in pulse mode, too. TruPlasma Bias Series 3000 / 4000 – the adaptable ones Standard and pulsed bias DC power supplies for a broad range of applications. Perfect for surface treatment of metals and other conductive materials. TruPlasma Arc Series 3000 – the arc cathode...

Using our knowledge for your benefits. Generators from TRUMPF Hüttinger– the power to meet your needs. From compact modules, to 19-inch rack and table top versions, to system solutions in stand-alone cabinets: TRUMPF Hüttinger offers a proven range of generators for plasma excitation in industry, science, research, and development. Our MF and RF generators are perfectly matched to all processes and can be seamlessly integrated into any system design concept. Their high up-time and progressive arc management enhances their already superior process stability. We offer leading technology...

Middle frequency (MF) TruPlasma MF Series 3000 / 7000 – the brilliant ones Equipped with our advanced arc management these MF generators are the market and technology leaders for large area coating applications in industrial environments. Radio frequency (RF) TruPlasma RF Serie 1000 - the robust ones Energy-efficient RF generator for coating and etching processes in semi­ conductor manufacturing applications. Accurate output power regu­ lation and extreme robust operation ensure maximum productivity. TruPlasma RF Series 7000 – the high performers Optimized RF generators utilizing reliable...

They’re not just accessories. You certainly need more than just a power source. The conditions and constraints present in many plasma environments require special devices to ensure that your equipment functions as desired. Matching networks, master oscillators, RF switches and coaxial cables: these are all critical elements in a well designed RF power delivery system. Engineers seeking a lasting, consistent process solution also choose these components from TRUMPF Hüttinger because of our extensive high frequency expertise and decades of process experience.

Matchboxes Impedance matching networks for the complex loads typical in plasma excitation. Master oscillators Precise frequency synchronization for applications with multiple RF sources. RF switches Provide power to several process chambers from a single generator. Coaxial cables Perfect for low-loss connections between the generator and matchbox.

Meeting your changing needs: TRUMPF Hüttinger DC solutions. Plasma processes are complex and ever changing, especially from application to application. If only your power supply adapted as fast as your requirements changed. In fact, by choosing modular DC generators from TRUMPF Hüttinger, you can make sure they do! Easy to scale and with numerous control options, we offer the flexibility you need to stay competitive. Direct current pulsed TruPlasma Highpulse Series 4000 High impulse power DC generators for deposi­ ting extremely precise thin film layers. Peak powers of up to 8 megawatts....

Direct current TruPlasma DC Series 3000 TruPlasma Bias Series 3000 Compact DC generators, ideally suited for metallic sputtering applications. These generators have a high power density and provide full rated power over a broad range of load impedances. The arc management CompensateLine ensures superior film qualities at high deposition rates. Versatile family of state-of-the-art DC bias power supplies. Two operation modes, low voltage (300 volts) and high voltage (1200 volts) support different applications, such as pre-treatment oder film deposition. Featuring dynamic current regulation,...

MF and RF generators from TRUMPF Hüttinger: high accuracy and repeatability you can count on, even under continuous load. A solution to rely on, no matter how critical the application may be.