orion-iii-brochure
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Plasma Enhanced Chemical Vapor Deposition The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice. Applications Non-pyrophoric PECVD processes. Films deposited: oxides, nitrides, oxynitrides, amorphous silicon. Process gases: <20% silane, ammonia, TEOS, diethylsilane, nitrous oxide, oxygen, nitrogen. The Orion III comes with full process support both prior to and subsequent to purchase. For a more detailed discussion of applications and processes, please visit www.triontech.com. Tool Features Reactor The cathode and anode are each machined out of single blocks of aluminum. After critical inspection they are hard anodized for protection from process chemistries. The bottom electrode is available in either 200mm or 300mm sizes and can process single wafers, dies or parts (2” - 300mm). Process gases are introduced into the chamber either by an annular ring or a showerhead manifold. Lower Electrode The system comes with a 300Watts (350-460kHz) bottom-powered electrode. Touch Screen A color flat panel display with touch screen interface provides the operator with full Operator process information at all times. The software interface guides the operator Interface through each sequence in a logical fashion and gives fingertip control of all process parameters. PC Process The PC process controller provides simple and reliable system control. The graphical Controller software package creates programs in block diagram form. Process recipes are stored on the hard drive or can be stored on USB flash drives allowing each operator to maintain individual recipes. AC The AC distribution module automatically distributes predefined power quantities to Distribution the various internal components. When the Emergency Power Off button is tripped, Module the RF power is shut off and all valves involved with gas delivery are automatically closed and the machine powers down to a safe standby mode. This system includes separate power controls for the main AC and peripherals.

Automatic Every Trion system includes a butterfly pressure control valve operated directly by Pressure the process controller. This provides independent pressure control separate from all Control other processing parameters. Gas Delivery State-of-the-art technology is utilized to ensure the utmost integrity and purity. System Each reaction chamber accommodates up to eight mass flow controllers and all Temperature Bottom electrode temperature can be controlled from 50°C to 400°C using a Control resistive heater and IR thermo-couple. Triode A 600Watts, 13.56MHz top-powered triode source...