MINILOCK-ORION III Plasma Enhanced Chemical Vapor Deposition (PECVD)
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MINILOCK-ORION III Plasma Enhanced Chemical Vapor Deposition (PECVD) - 1

MINILOCK-ORION III Plasma Enhanced Chemical Vapor Deposition (PECVD) The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the lab and pilot line production environments. The Minilock-Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice. Applications Toxic/Pyrophoric PECVD Processes. Films deposited: oxides, nitrides, oxynitrides, amorphous silicon and silicon carbide. Process gases: 100% silane, ammonia, TEOS, diethylsilane, nitrous oxide, oxygen, nitrogen, trimethylsilane and methane. The Minilock-Orion III comes with full process support both prior to and subsequent to purchase. For a more detailed discussion of applications and processes, visit www.triontech.com. Tool Features Reactor The cathode and anode are each machined out of single blocks of aluminum. After critical inspection they are hard anodized for protection from process chemistries. The bottom electrode is available in either 200mm or 300mm sizes and depending on electrode configuration, can process single wafers or mounted parts (3” to 300mm). It also has multiple size batch capability (4x3”; 3x4”; 7x2”). Process gases are introduced into the chamber either by an annular ring or a showerhead manifold. Lower The system comes with a 300Watts (350-460 kHz) bottom-powered electrode. Electrode Touch Screen A color flat panel display with touch screen interface provides the operator with full Operator process information at all times. The software interface guides the operator Interface through each sequence in a logical fashion and gives fingertip control of all process parameters. PC Process The PC process controller provides simple and reliable system control. The graphical Controller software package creates programs in block diagram form. Process recipes are stored on the hard drive or can be stored on USB flash drives allowing each operator to maintain individual rec

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MINILOCK-ORION III Plasma Enhanced Chemical Vapor Deposition (PECVD) - 2

AC The AC distribution module automatically distributes predefined power quantities to Distribution the various internal components. When the Emergency Power Off button is tripped, Module the RF power is shut off and all valves involved with gas delivery are automatically closed and the machine automatically down to a safe standby mode. This system includes separate power controls for the main AC and peripherals. Automatic Pressure Control The system includes a butterfly pressure control valve operated directly by the process controller. This provides independent pressure control separate...

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