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TESCAN S8000
TESCAN S8000
The TESCAN S8000 is a new generation Scanning Electron Microscope (SEM) designed to meet high demands for image quality and sample microanalysis across various research and technology fields. It features the TESCAN BrightBeam™ SEM column technology for ultra-high resolution and the TESCAN Essence™ software for ease of use.
Key Features and Benefits
- Universality in Sample Analysis: Offers ultra-high resolution imaging (0.9 nm at 15 keV, 1.4 nm at 1 keV) suitable for magnetic samples.
- Maximum Insight: Provides excellent contrast for morphological characterization and analysis of nanoparticles and semiconductor inspection.
- Protection for Beam-Sensitive Samples: Low beam energy imaging prevents charging artifacts and sample damage, with a variable pressure mode for hydrated specimens.
- Microanalysis Conditions: Operates at electron currents up to 400 nA, supporting demanding SEM analytical techniques.
- Enhanced Surface Sensitivity: Detection system with angle-selective and energy-filtering capabilities for topographic and material contrast.
- Reliability in Lengthy Applications: EquiPower™ lens technology ensures stability for time-consuming applications.
- Ease of Use: Customizable software with workflow-oriented wizards for maximum control and productivity.
- Wide Field Optics™: Dual objective lens configuration for a large field of view and easy mode switching.
Technical Specifications
- Electron Optics: High brightness Schottky emitter with BrightBeam™ column and Wide Field Optics™ technology.
- Resolution: 0.9 nm at 15 keV, 1.4 nm at 1 keV, and 0.9 nm at 30 keV.
- Electron Beam Energy: Ranges from 50 eV to 30 keV.
- Probe Current: Less than 1 pA to 400 nA.
- Detectors: Includes Multidetector, Axial detector, E-T detector, and optional detectors like HADF R-STEM, EDS, WDS, EBSD, CL, EBIC.
- Chamber and Stage: Features a large chamber with active vibration isolation and a fully motorized specimen stage.
Applications
- Failure Analysis in Semiconductor Industry: Ideal for SEM investigations and failure analysis of semiconductor devices, especially those with beam-sensitive materials.
- Characterization of Nanomaterials: Offers high-resolution imaging for understanding nanomaterial properties and mechanisms.
- Life Sciences Imaging: Provides high contrast imaging for biological specimens, preserving integrity during imaging.
Catalog excerpts
Btescan PERFORMANCE IN NANOSPACE TESCAN S8000 New generation of SEM microscope
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TESCAN S8000 Ultra-high resolution and best conditions for microanalysis guaranteed in one single instrument The TESCAN S8000 is a Scanning Electron Microscope beam currents and first-class imaging performance (SEM) that comes to satisfy the most demanding with outstanding contrast at low beam energies. The needs for image quality and sample microanalysis new TESCAN Essence™ software platform is the key that routinely arise in different fields of research and component which makes the TESCAN S8000 an easy- technology. Researchers can now benefit from all the to-use microscope; excellent images...
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TESCAN BrightBeam™ SEM column technology The electron optics in the new TESCAN BrightBeam™ SEM column technology is based on a combined electrostatic-magnetic objective. A potential tube through the whole column keeps electrons at an energy that is higher than the electron beam landing energy, and as a result, electrostatic interactions within the beam are reduced which in turn, reduces significantly optical aberrations specially at low beam energies. In addition, the potential tube makes the electron beam less susceptible to environmental (stray) magnetic fields. These features result in excellent...
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When it comes to versatility, the TESCAN S8000 microscope delivers a truly flexible analytical platform that offers excellent quality in imaging with superb contrast. Whether your samples are conductive or nonconductive, magnetic or nonmagnetic, organic or inorganic, the TESCAN S8000 offers the ideal imaging conditions thanks to its advanced detection system with electron-signal filtering capabilities and variable pressure operations. Fig: TESCAN Essence™ -- simplified GUI and customisable. New TESCAN Essence software platform makes microscope control easier than ever ĬĬSimplified UI with fast...
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Applications It is the excellent performance at low beam energies which makes the TESCAN S8000 ideal for characterisation of nanomaterials, rigorous quality control in the high-end manufacturing industries or routine inspection and fault isolation tasks for the purposes of failure analysis of microelectronic devices in semiconductor foundries. Failure Analysis in the Semiconductor Industry Fig.: SEM image at 700 eV of an IC delayered to the transistor contact layer. Topography contrast provided by the E-T detector reveals that M1 layer is not fully removed and delayering is not completed. The...
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*With the optional Beam Deceleration Technology (BDT)
Open the catalog to page 6All Tescan GmbH catalogs and technical brochures
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