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OG-5000 Series

OG-5000 Series

OG-5000 Series

Product catalog summary
Overview
The OG-5000 Series High Purity Ozone Generator is designed for semiconductor applications, providing high concentrations of ultra-clean ozone gas. It is suitable for processes such as Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), oxide growth, and cleaning processes.

Key Features
  • High purity and concentration of ozone
  • Low cost of ownership with no consumables
  • Compact and modular design
  • Proven technology for semiconductor applications

Applications
  • Chemical Vapor Deposition (CVD)
  • Atomic Layer Deposition (ALD)
  • Oxide growth
  • Surface conditioning
  • Ashing
  • Particle cleaning
  • Photoresist removal

Specifications
  • Maximum Ozone Production: OG-5000-A: 210 g/hr, OG-5000-B: 150 g/hr
  • Control Interface: Front panel or automatic remote control
  • Feed Gas: Oxygen Grade 6 or better, Nitrogen Grade 5 or better for doping
  • Feed Gas Flow Rate: 0.5 to 20 slpm
  • Ozone Outlet Pressure: 15 to 40 psig (typically set to 30 psig)
  • Operating Ambient Temperature: 5° - 35°C
  • Cooling Water Flow Rate: 2.5 GPM
  • Cooling Water Temperature: 18°C ±2°C
  • Power: 208/240 VAC, 1 Phase or 3 Phase, 50 or 60 Hz
  • Dimensions: 19” x 10.5” x 18” (48 cm x 27 cm x 45 cm)
  • Weight: 82 lbs. (37 kg)
  • Compliance: CE
  • Warranty: 1 year

Additional Information
The OG-5000 series can be integrated with Teledyne APi’s ozone system controller, ozone leak detectors, ozone concentration monitors, and ozone destructs, making it versatile for various semiconductor process applications.
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Catalog excerpts

OG-5000 Series-1

Features ■ High purity ozone ■ High ozone concentrations ■ Low cost of ownership ■ No consumables ■ Compact and modular ■ Proven technology The OG-5000 series of ozone generators is designed to produce high concentrations of ultra clean ozone gas for use in semiconductor applications including CVD, ALD thin film, oxide growth and wet bench cleaning processes. The OG-5000 series has a compact, water cooled design that can be easily integrated with Teledyne API's ozone system controller, ozone leak detectors, ozone concentration monitors and ozone destructs. Its proven technology makes it ideal for a wide range of semiconductor process applications. Applications ■ Chemical Vapor Deposition (CVD) ■ Atomic Layer Deposition (ALD) ■ Oxide growth ■ Surface conditioning ■ Ashing ■ Particle Cleaning ■ Photoresist Removal ■ Others

 Open the catalog to page 1
OG-5000 Series-2

Specifications Performance Maximum Ozone Production — OZONE INSTRUMENTATION FOR EVERY APPLICATION — Specifications subject to change without notice. All specifications are based on constant conditions. Printed documents are uncontrolled. SAL000099B (DCN 8030) H.20.18 TELEDYNE API Eve ry wh e rey o u I oo k' 9970 Carroll Canyon Road, San Diego, CA 92131 • USA Tel. 858-657-9800 • [email protected] www.teledyne-api.com

 Open the catalog to page 2

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.