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Analytical Instrumentation Thin Film Measurement Systems for Single and Multilayer Film Structures
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Analytical Instrumentation Thin Film Measurement Systems for Single and Multilayer Film Structures - 1

Analytical Instrumentation Surf the New Wave in Portable Fiber Optic Spectrometry Thin Film Measurement Systems for Single and Multilayer Film Structures StellarNet’s Thin Film measurement systems measure thickness and index of both single-layer and multilayer films in less than a second (up to 5+ layers). The non-contact thickness measurement systems come complete with instrumentation and software including a large library of materials data to support multilayer, freestanding, rough, and both thick & thin layer structures. With USB connectivity and the powerful, user-friendly TFCompanion software, daily complex measurements are made quick and simple! Several configurations are available for measuring thin films with spectral response in UV-VIS, VIS-NIR and NIR wavelength ranges (details on reverse). StellarNet Thin Film Systems Ideal For: • Solar PV Films (TFPVs) including thin silicon, II-VI (primarily CdTe), CIGS, TCO stacks, and polymides. • On-line thickness measurements of oxides, silicon nitride and many other semiconductor process films. • In-situ measurement during MEMS patterning processes used to measure thick photoresist uniformity & thickness. • Hardcoat measurements to measure thickness of protective films in the automotive and aviation industries. • StellarNet Systems are also typical in coating measurement applications. • Measure LCD & OLED displays, cell gaps • The thickness of rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics ITO & polyamide structures. Anti-reflection coating (SiNx) is represented using Tauc-Lorentz oscillator ThinFilmCompanion Features: Real-time Spectral Capture and Instrument control for Reflectance and/or Transmittance Includes Large Library of Materials Data Supports multilayer, freestanding, rough, and both thick and thin layer structures New materials can be easily added by measuring corresponding sample or importing data from file Supports Parameterized materials : Cauchy, Sellmeir, EMA (effective-medium approximation), Harmonic oscillator, Tauc-Lorentz oscillator, Drude-Lorentz 14390 Carlson Circle, Tampa, Florida, 33626 USA Voice: +1-813-855-8687 Fax: +1-813-855-0394 www.StellarNet-Inc.com ContactUs@StellarNet-Inc.com

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Analytical Instrumentation Thin Film Measurement Systems for Single and Multilayer Film Structures - 2

Measured optical dispersion (n,k) of SiNx (ARC layer) represented using Tauc-Lorentz approximation. Transmittance of a free standing polymer. Estimated thickness is ~ 81.9um The operating software includes a large library of refractive index (n) and extinction coefficient (k) values for the most common metallic, dielectric, amorphous and crystalline substrate materials. Analyze simple and most complex filmstacks - graded layers, periodic structures, very thick films, films on thin substrates, multi-sample measurements, etc. Measurements are made using reflectance/transmittance spectroscopy...

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