• Grid-based OPC simulation eliminates the need for user-defined simulation sites, simplifying setup.
• Simulates design manufacturing through the process window, allowing variation of RET recipes to determine the best OPC score.
• Provides accurate wafer contour simulation for advanced process conditions, including immersion lithography.
• Supports various OPC usage models, including recipe verification and mask sign-off.
• Offers customizable scripts for error checks and integrates results into the user's workflow.

Calibre OPCverify introduces a grid-based simulation for virtual manufacturing at 65 nanometers and below. It addresses the complexity of low k1 photolithography processes by overlaying a virtual grid on designs to detect failures before manufacturing. This tool enables comprehensive error analysis and integrates with Calibre WORKbench for result analysis.

The Calibre tool suite provides a complete IC and SoC design-to-manufacturing solution, enhancing performance and reducing turnaround times. It includes tools for Optical and Process Correction (OPC), Phase Shift Mask, and more, ensuring silicon accuracy and excellent yield.

• Unified flow from GDSII/OASIS to mask with a common command language and hierarchical processing engine.
• Single, accurate modeling foundation for all lithography simulations.
• Verification checks through the Verification Center interface, including pinching, bridging, and CD variation checks.

Mentor Graphics Corporation has headquarters in the USA, Europe, Pacific Rim, and Japan, providing comprehensive support and sales information.