Omni \ Fn#w»L \ Ltytn \ T*m \ Calibre offers easy to use process modeling and tool setup, with production- worthy accuracy and enhanced turn-around-time. The Calibre WORKbench screen above shows some of the modeling and graphing tools. The highly accurate Calibre simulation (lower right) matches the SEM (Scanning Electron Micrograph) wafer image (lower left). Calibre OPC and PSM: Enabling Silicon Accuracy, Speed and Yield from 180nm to 65nm and Beyond The Calibre product line's subwavelength tools—such as Calibre OPCpro, Calibre ORC, Calibre PSMgate and Calibre OPCsbar—are the first complete design-to-silicon solution. By deeply integrating OPC (optical and process correction), PSM (phase-shift mask) and SB (scattering bar) technology with the industry's physical verification standard, Calibre DRC and Calibre LVS, the Calibre solution delivers silicon accuracy, fastest turn around time available, and excellent yield. The benefits will be realized with the largest designs and with the complexity of OPC and PSM correction layers to be reliably corrected Accurate sub-wavelength silicon: Calibre's high-NA vector model, TCCcalc, and new process model, VT5, will ensure unsur- passed accuracy RET (reticle enhancement technique) solutions. Since Calibre's sub-wavelength tool suite is fully integrated into Calibre's physical verification standard, the full backend process can be executed within a single job deck, from post-layout to Decreased production costs: and PSM output minimizes mask costs and lowers overall write • Flexible OPC choices: Calibre's flexibility enables just the right each run by offering a choice between rule-based OPC, mini- mizing compute intensity, and/or model- based OPC, maximizing correction thoroughness, even • High performance chips: A complete PSM solution enables printing of fast, small gates and other structures while minimizing

Fast, Verifiable Production Calibre’s integrated design-tosilicon products provide a productionworthy environment unique to the Calibre architecture, including industry leading verification and design-formanufacturability correction. Consider the following strengths of the toolset (full-chip, batch production tools): • Single software executable allows a single fast run to perform many postlayout processing steps, with no import/export database delays, while preserving the hierarchy. One run offers layer derivation, Boolean operations, SB, DRC, mixed rule/modelbased OPC, PSM, phase-checking,...

Calibre TDopc (Table-Driven OPC) is a product with two commands: OPCBIAS and OPCLINEEND. The first command makes it easy to do fast rule-based OPC for line widths based on a simple table of values. The second command makes it easy to apply lineend treatments, such as hammerheads, based on a simple table of values. Calibre TDopc’s capabilities are also available in the Calibre OPCpro license. Calibre PRINTimage (Simulated Silicon Print Image) produces a fullchip, batch output of simulated silicon shapes, and enables simplified DRC checks on these shapes, or “silicon DRC”. The simulation is based...

Model Flow Tool Output Options weight GO filter pitch iso end \ weight 30 filter dense end \ search gradient \ Calibre WORKbench Model Flow Tool automates the full optical and process model calibration routines along with results analysis. /scratcm /gbaileyfTest/Model now/Optical Course .mfr Calibre WORKbench Model Center has easy yet powerful graphing capabilities to visualize and fine tune model accuracy. conflict checking essential to a strong or attenuated complete PSM flow. Examples include shape-based checking, long-range "colorability', and side-lobe detection and correc- Calibre OPCsbar...

image parameters enabled through VT5. • Simulated views of layout include: optical-intensity map, printed image on the wafer, fragmentation sites, 2D cross-section intensity maps, multilevel print-image contours. • Integrated execution of the batch tools on small, selected regions for testing. • Automated model calibration through Calibre WORKbench Model Flow Tool. Calibre LITHOview is a subset of Calibre WORKbench. It offers the same capabilities as WORKbench, except for model creation and test pattern generation. This tool is targeted for users to confirm layout or OPC model results without...

Summary The Calibre Design-to-Silicon solution is unique in the marketplace. It is the only tool suite that is productionworthy and truly integrates industry leading verification with a full suite of full-chip OPC, PSM and SB tools. This provides: • Unsurpassed turn-around-time. • Design independent tool setup and consistently fast run-times with highly scalable multi-threading and distributed performance. • Verifiable data integrity. • Mask-friendly output and low data expansion. • Extends the practical life of manufacturing equipment. • High-NA Vector and extensive process modeling capability...