
Calibre nmOPC is a next-generation OPC technology designed to address the complexities of low k1 photolithography processes in nanometer designs, particularly at the 45nm node. It offers dense simulation, process window optimization, and a hybrid computing platform with co-processor acceleration. The technology uses the Calibre SVRF command language and OASIS file format to minimize file size.
Calibre nmOPC provides 100% simulation coverage for mask layers and uses process window correction algorithms to ensure successful silicon patterning. It applies contour-based constraints to preserve design intent and yield across the process window.
The Remote Acceleration Simulation (RAS) architecture allows for the integration of a Coprocessor Acceleration cluster, enhancing performance by 4 to 10 times with minimal increase in computing requirements.
The new 4th generation compact resist process model (CM1) offers improved accuracy for 45 and 32 nm processes, leveraging dense simulation and coprocessor acceleration for stable model calibration.
The Calibre tool suite provides a comprehensive IC design-to-manufacturing solution, simplifying the handoff from design to manufacturing. Tools like Calibre MT, MTflex, and Hyperscaling enhance performance and reduce turnaround times.
Mentor Graphics Corporation has headquarters in the USA, Europe, Pacific Rim, and Japan, providing global support and sales services.
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