R&D VACUUM DEPOSITION TOOL 1. APPLICATION AND MAIN FEATURES 1.1 Main application R&D vacuum deposition tool SAF L-EM is a laboratory scale system designed for producing single-sided metal coatings on flat substrates. The tool is aimed to produce coated material for Customer's investigated product concept/technology proof. The found solutions can be subsequently used for scaling up of the proven product technology. The tool can be used to deposit several materials by evaporation and magnetron sputtering that provides possibility to have various combinations of coatings. The design of the tool allows to add deposition capacity for other materials besides mentioned in this specification. 1.2 Design R&D tool SAF L-EM is one of the Sidrabe's SAF cluster tool product line deposition systems. Please refer to: https://www.sidrabe.com/products/special-equipment/cluster-tool.html

1.3 Main features of the tool 1.3.1 The tool is a batch-operating machine with substrate set loading before beginning of the cycle and product unloading after the cycle is finished. 1.3.2 The tool is intended for processing thin ceramic or glass substrates. Process chamber 1.3.4 Coating deposition is carried out either by means of thermal evaporation of lithium or by means of magnetron sputtering from metallic targets. During deposition, orientation of the substrate is horizontal. Debris-free and uniform coating is ensured due to upward deposition. 1.3.5 The pumping station consists of turbopumps...

2. MAIN COMPONENTS OF THE TOOL2.1 Process chamber 2.1.1 View port. 2.1.3 Lid (to change deposition source, change magnetron target or load crucible). 2.1.5 Li evaporation set consisting of heated crucible with shutter, electrical heaters, water-free cooled enclosure for crucible. 2.1.6 Magnetron deposition set consisting of a planar magnetron and shields. 2.2.2 Lid (to load and unload cassette holder with samples). 2.2.4 Zone for sample cooling. 2.2.5 Zone for installation of the ion etch unit. 2.2.6 Linear magnetic manipulator for cassette transport. 2.2.8 Screw driven linear actuator for cassette...

2.3 Service systems 2.3.1 Dry forevacuum pump for each chamber. 2.3.2 Turbomolecular pump for each chamber. 2.3.3 Electric panel with control system. 2.3.5 Evaporator power supply. 2.3.6 Magnetron power supply. 2.6 Software backup copy 3. OPTIONAL EQUIPMENT • Ion etch unit in the storage chamber.

4. TECHNICAL PARAMETERS OF THE TOOL4.1 Substrate 4.1.1 Material ceramics, glass 4.1.2 Flat substrate shape rectangular 4.1.3 Maximum substrate thickness 200 pm 4.2.1 Coating type single-sided coating 4.2.2 Masking of the substrate outer edges ~ 1 mm 4.2.4 Metal coating thickness < 800 nm 4.2.5 Targeted coating uniformity ± 5% 4.3.1 Type heated, batch loaded 4.3.2 Expected dynamic deposition rate 0.6 pm*m/min planar rectangular magnetron with balanced magnetic system 160 x 120 mm 8 x 10-4 - 5 x 10-3 Torr 4.4.2 Estimated target area

4.5 Pumping system 4.5.1 Base pressure in the storage chamber 4.5.2 Base pressure in the process chamber < 5 x 10-7 Torr 4.6 Thermostating system 4.6.1 Supply line temperature -10 - +80o C 4.6.2 Type of cooling/heating aggregate Air cooled recirculating chiller 4.7 Compressed air and Argon (supplied by the Customer) 4.7.1 Compressed air pressure 4.7.2 Ar purity 4.9 Overall dimensions of the tool 4.9.1 Tool (excluding electrical cabinets) with service zone (minimum), L x W x 3.8 x 3.0 x 2.0 m H 4.9.2 Weight 4.10 Electrical system 4.10.1 Mains frequency 4.10.2 Mains voltage 4.10.3 Control voltage...

5. SAFETY STANDARDS 5.1 The tool is built in accordance with the safety regulations of European Commission and European Standards: • 2006/42/EC (Machinery Directive); • 2006/95/EC (Low Voltage Directive); • EN60204-1:2006+A1:2009 (Safety of Machinery). 5.2 Safety standards and regulations of the Customer's country and as provided by the Customer are regarded as well.