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Equipment for PV materials

Equipment for PV materials

Equipment for PV materials

Product catalog summary
Overview: The document provides detailed information on customized vacuum coating systems specifically designed for photovoltaic (PV) materials and thin film technologies. It highlights the capabilities of Physical Vapor Deposition (PVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD) coaters, as well as contract research services.
Technological Capabilities:
  • Transparent Conductive Coatings: Utilizes magnetron sputtering with ceramic and metal targets for transparent coatings such as TCO (ITO, ZnO, AZO, SnO2).
  • Metal and Alloy Coatings: Employs magnetron sputtering and thermal evaporation for metal contact and active layers, including materials like Cu, Ag, In, Ti, Ni, Mo, Cr, NiCr, St.St., NiCo.
  • Oxides and Nitrides Coatings: Uses magnetron sputtering for antireflection, moisture-proof, and protective coatings with materials like SiO2, TiO2, TiN, Si3N4.
  • Preliminary Processes: Includes drying by heating, plasma pretreatment, and vacuum lamination of web substrates.
Equipment Capabilities:
  • Roll-to-Roll Coaters: Suitable for metal and non-metal webs.
  • In-line Sputtering Systems: Designed for glass sheets.
  • PECVD Coaters: Used for amorphous silicon deposition.
  • Additional Equipment: Includes drying machines and vacuum laminators.
Substrate Specifications:
  • Polymer Materials: Width 0.3 to 2.0 m, thickness 25 to 300 μm.
  • Metal Foils: Width 0.15 to 1.5 m, thickness 10 to 100 μm.
  • Glass: Size up to 2.5 m x 3.5 m.
  • Powder Materials: Size 30 to 800 μm.
Contact Information: Sidrabe, 17 Krustpils Str., Riga, LV1073, LATVIA. Tel: +371 67249-806, Fax: +371 67139-506, Email: [email protected], Website: www.sidrabe.com
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Catalog excerpts

Equipment for PV materials-1

Customized Vacuum Coating Systems Equipment for PV materials Thin film technologies PVD and PECVD coaters Contract research

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Equipment for PV materials-3

• Transparent conductive coatings – TCO (ITO, ZnO, AZO or SnO2) by magnetron sputtering with ceramic target and metal targets in quasireactive and reactive processes for transparent coatings • Metal and alloy coatings (Cu, Ag, In, Ti, Ni, Mo, Cr, NiCr, St.St., NiCo etc.) by magnetron sputtering and thermal evaporation for metal contact and active layers coatings • Oxides and nitrides (SiO2, TiO2, TiN, Si3N4 etc.) by magnetron sputtering with ceramic targets and metal targets in quasi-reactive and reactive process for antireflection, moisture-proof, and other protection coatings • Preliminary...

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Equipment for PV materials-4

Contacts: 17 Krustpils Str. Riga, LV1073, LATVIA Tel: +371 67249-806 Fax: +371 67139-506 E-mail: [email protected] http://www.sidrabe.com

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.