Catalog excerpts
Ultra-Pure Submonolayer and Multilayer Thin Film Growth • Evaporation from Wires, Rods or Crucibles • Integrated Flux Monitor • Water Cooling for Minimum Pressure Rise • Rear Loading for Alignment Preservation • Comfortable Lab View-based PC Software An Oxford Instruments Company
Open the catalog to page 1Precise Real-Time Flux Control The EFM evaporators with integrated flux monitor are ideal for high-purity evaporation of a wide range of materials in UHV, ranging from refractory metal wires and rods to delicate, reactive substances evaporated from crucibles. Materials such as Fe, Co, Ni, Pt, Ag, Au, Al, Mo, Ta, W, and also non-conducting materials or semiconductors, e.g. silicon, can be evaporated. Delicate or reactive materials can be precisely and cleanly deposited. Using a stainless steel crucible with a nozzle, a gentle Knudsen evaporation of C60 and many other aromatic compounds is...
Open the catalog to page 2Electronics & Software The microprocessorcontrolled EVC 300 makes the operation of all EFM-type UHV evaporators very convenient and safe. The 300 W power output is sufficient for the evaporation of any desired material, except for the extra large crucibles of the EFM 6 where the dedicated EVC 1200 delivers up to 1200 W. All parameters of the EVC 300 can be set manually on the front panel or via the Lab View-based 'EPITASS' software. Automatic temperature monitoring of the evaporator cooling ensures automatic shutdown if a preselectable maximum temperature is exceeded. An external interlock...
Open the catalog to page 3Ultimate Precision down Sample distance: typically 10-150 mm Minimum radius for clearance at shutter position: 16 mm Sample distance: typically 10-150 mm Extremely clean evaporation It features the same proven capabilities in terms of evaporation area, temperature without the shutter and flux monitor. robust analogue supply with 100 W output power and emission regulation for stable growth conditions. Together both add up to a cost-effective yet reliable evaporator package, suitable for many different deposition tasks. Shutter and flux monitor can easily be Flux monitor Integrated shutter...
Open the catalog to page 4a Fraction of a Monolayer NW 35 CF Ø 33 NW 35 CF Ion Lens Flux Monitor 125 65 140-165 Ø 30 125 65 184 210 140-165 Minimum radius for clearance at shutter position: 20 mm Sample distance: typically 10-150 mm 210 Minimum radius for clearance at shutter position: 34 mm Sample distance: typically 10-150 mm EFM 3i EFM 4 • • • • • • • • • • Ion-Beam-Assisted Deposition Ion suppression Evaporation area Ø 5 - 20 mm Flux monitor Integrated shutter Specifically designed for a smooth layer growth of difficult materials, the EFM 3i allows the controlled evaporation of the target material, and the...
Open the catalog to page 5NW 35 CF Ø 62 Cooling Water Ø 54 134 165 320 210 NW 35 CF Ø 34 161 Minimum radius for clearance at shutter position: 36 mm Flange to sample distance: 254 mm Minimum radius for clearance at shutter position: 68 mm EFM 6 Triple EFM • • • • • • • • • • Evaporation area Ø > 50 mm Crucible capacitiy up to 10 cm3 Evaporation from wires, rods or crucibles Integrated cooled shutter Water cooling for minimum pressure rise The EFM 6 evaporator extends the EFM product range onto a larger scale. With a NW 63 CF (4.5" OD) base flange and a crucible capacity of up to 10 cm3, the EFM 6 holds about ten...
Open the catalog to page 6Sample distance: Side view of EFM-H with leak valve. • Flange to sample distance: 203 mm or larger • Compatible with NGEFM inlet, pumping bypass • Effective water cooling Filament Tungsten capillary Gas admission Cooling shroud THE EFM-3H is carefully designed to deliver a shar- ply defined beam profile. By adjusting the heating power, different spot profiles can be selected. Schematic cross section bemiconductor surfaces (of thin film growth and other similar applications using atomic hydrogen. The EFM-H features a cracking efficiency close to 100%, a smooth, flat and sharpely defined spot...
Open the catalog to page 7Headquarters: Omicron NanoTechnology GmbH Limburger Str. 75 65232 Taunusstein, Germany Tel. +49 (0) 61 28 / 987 - 0 Fax +49 (0) 61 28 / 987 - 185 Web: www.omicron.de e-mail: info@omicron.de Minneapolis Pittsburgh East Grinstead Linköping Moscow Poznan Beijing We have agents and partners worldwide – please check our website to find your nearest contact. Seoul Tokyo Taipei Mumbai Omicron NanoTechnology is part of the Oxford Instruments Group. For more information: www.oxford-instruments.com or just send us an e-mail: info.plc@oxinst.com Singapore Denver Madrid St. Cannat 50 EFM 4 50 40 0...
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