MSLAB 103-V05/10.04 MULTISCAN STM The New Stage for the MULTISCAN LAB™ LAB Increased complexity of today‘s applications requires high-resolution structural and chemical analysis of nanometer-scaled structures. The integral combination of different analysis technologies is the key to gain complementary information of the very same sample area. This goal is ideally achieved with the new goniometermounted MULTISCAN STM, integrated in the MULTISCAN LAB™. To allow optimal and simultaneous SEM and SAM operation together with SPM under different rotation angles, a new scanner design was developed. The SPM ts into the small gap between sample and MULTISCAN LAB™: Complete UHV system solution with UHV Gemini Column and NanoSAM. SEM column with 8 mm working distance. Although the scanner is ultra compact, it offers a scan range of 6 x 6 x 1.5 µm in XYZ, while meeting all stability criteria of a state-of-the-art SPM. Moreover, the rigid design also enables the use of a spring loaded sensor exchange with a non-magnetic tip carrier, avoiding magnetic stray elds for unsurpassed low energy SEM performance. This makes the new MULTISCAN STM an ideal partner for the UHV Gemini Column. The low beam energy performance and ultimate resolution below 3 nm offers unsurpassed SEM capabilities and makes SPM work efciently with SEM assisted probe navigation. Chemical analysis is pushed to previously unknown limits by the introduction of the NanoSAM energy analyser, enabling Scanning Auger Microscopy resolution below the 10 nm benchmark. The new MULTISCAN STM: UHV-Gemini Column NanoSAM EA UHV-Gemini Column NanoSAM EA 8mm MULTISCAN STM Stage UHV-Gemini Column NanoSAM EA 8mm MULTISCAN STM Stage 8mm MULTISCAN STM Stage Side view of the MULTISCAN STM with UHV Gemini The goniometer-mounted MULTISCAN STM with UHV Gemini Column and Column and NanoSAM energy analyser. NanoSAM energy analyser. Schematic with 25° tilted MULTISCAN STM. Omicron NanoTechnology GmbH www.omicron.de 25°

:_Nano Technology Atomic resolution STM on Au(111) at Atomic resolution STM on Si(111)- Pre-amplifier technology: Schematic switchable feedback resistors and compensation at the very first operational amplifier stage. (7x7) at a TRUE tunneling current of SEM image of ZnO insulating nanocrystals. Excellent SEM image of Au islands on Carbon. Ultimate resolu- resolution at low beam energy, 200 eV. tion below 3 nm at 15 keV. Line profile showing 2.3 nm resolution. Spot size defined as the 200/o-80°/o width of a step edge. Corresponding silicon line profile with sub- Your local partner: Headquarters:...