Catalog excerpts
Ultra-Pure Submonolayer and Multilayer Thin Film Growth • Evaporation from Wires, Rods or Crucibles • Integrated Flux Monitor • Water Cooling for Minimum Pressure Rise • Rear Loading for Alignment Preservation • Comfortable Lab View-based PC Software An Oxford Instruments Company
Open the catalog to page 1Precise Real-Time Flux Control The EFM evaporators with integrated flux monitor are ideal for high-purity evaporation of a wide range of materials in UHV, ranging from refractory metal wires and rods to delicate, reactive substances evaporated from crucibles. Materials such as Fe, Co, Ni, Pt, Ag, Au, Al, Mo, Ta, W, and also non-conducting materials or semiconductors, e.g. silicon, can be evaporated. Delicate or reactive materials can be precisely and cleanly deposited. Using a stainless steel crucible with a nozzle, a gentle Knudsen evaporation of C60 and many other aromatic compounds is...
Open the catalog to page 2Electronics & Software The microprocessorcontrolled EVC 300 makes the operation of all EFM-type UHV evaporators very convenient and safe. The 300 W power output is sufficient for the evaporation of any desired material, except for the extra large crucibles of the EFM 6 where the dedicated EVC 1200 delivers up to 1200 W. All parameters of the EVC 300 can be set manually on the front panel or via the Lab View-based 'EPITASS' software. Automatic temperature monitoring of the evaporator cooling ensures automatic shutdown if a preselectable maximum temperature is exceeded. An external interlock...
Open the catalog to page 3Ultimate Precision down to Sample distance: typically 10-150 mm Minimum radius for clearance at shutter position: 16 mm Sample distance: typically 10-150 mm Extremely clean evaporation Upgradeable Cost-effective Temperature range: 160 °C - 3300 °C Fully bakeable up to 250 °C The EFM 2 is a basic version of the EFM 3. It features the same proven capabilities in terms of evaporation area, temperature range, reliability etc. as the EFM 3, but without the shutter and flux monitor. The dedicated EVC 100L electronics is a robust analogue supply with 100 W output power and emission regulation for...
Open the catalog to page 4Ion Lens Flux Monitor Minimum radius for clearance at shutter position: 20 mm Sample distance: typically 10-150 mm Minimum radius for clearance at shutter position: 34 mm Sample distance: typically 10-150 mm Ion-Beam-Assisted Deposition Ion suppression Evaporation area Ø 5 - 20 mm Flux monitor Integrated shutter Specifically designed for a smooth layer growth of difficult materials, the EFM 3i allows the controlled evaporation of the target material, and the generation of ions for Ion-BeamAssisted Deposition (IBAD). The EFM 3i is based on the wellknown EFM 3 evaporator, with the addition of...
Open the catalog to page 5Cooling Water Minimum radius for clearance at shutter position: 36 mm Flange to sample distance: 254 mm Minimum radius for clearance at shutter position: 68 mm Evaporation area Ø > 50 mm Crucible capacitiy up to 10 cm3 Evaporation from wires, rods or crucibles Integrated cooled shutter Water cooling for minimum pressure rise The EFM 6 evaporator extends the EFM product range onto a larger scale. With a NW 63 CF (4.5" OD) base flange and a crucible capacity of up to 10 cm3, the EFM 6 holds about ten times as much material as the EFM 3. Already at a short working distance the evaporation area...
Open the catalog to page 6Cooling Water Side view of EFM-H with leak valve. Minimum radius for clearance at shutter position: 32 mm. Gas Inlet Sample distance: typically 50 to 150 mm Precise dosage of the hydrogen beam is guaranteed by the reliable EFM-series shutter system. (optional) Based on Proven Technology The temperatures, heating power, and other parameters required for the thermal dissociation of H2 molecules at a tungsten surface are very similar to those obtained during operation of the well-known EFM evaporator. It was therefore a tempting thought to use this proven product as the basis for an atomic...
Open the catalog to page 7Headquarters: Omicron NanoTechnology GmbH Limburger Str. 75 65232 Taunusstein, Germany Tel. +49 (0) 61 28 / 987 - 0 Fax +49 (0) 61 28 / 987 - 185 Web: www.omicron.de e-mail: info@omicron.de East Grinstead Linköping Moscow Poznan Beijing We have agents and partners worldwide – please check our website to find your nearest contact. Seoul Tokyo Taipei Mumbai Omicron NanoTechnology is part of the Oxford Instruments Group. For more information: www.oxford-instruments.com or just send us an e-mail: info.plc@oxinst.com stabilised flux 70 mA emission. 70 mA emission about 700 ca. 700V V stabilised...
Open the catalog to page 8All Scienta Omicron catalogs and technical brochures
-
NanoESCA
4 Pages
-
UHV Suitcase
2 Pages
-
ARPES-Lab
4 Pages
-
Cryo Manipulators
2 Pages
-
XPS-Lab
2 Pages
-
Fermi DryCool SPM
8 Pages
-
TESLA JT SPM
8 Pages
-
Argus CU
7 Pages
-
UHV NANOPROBE
12 Pages
-
Fermi SPM
8 Pages
-
Leonova Diamond
8 Pages
-
Leonova Emerald
12 Pages
-
Intellinova
4 Pages
-
MULTIPROBE
8 Pages
-
Omicron EFM V05
8 Pages
-
PRO-75/100 MBE Systems
2 Pages
-
EVO-25/50 MBE Systems
2 Pages
-
LAB-10 MBE System
2 Pages
-
ISE 5
2 Pages
-
EKF 300
2 Pages
-
Omicron CN 10 V02
2 Pages
-
MBD-LEED
8 Pages
-
FOCUS PEEM
16 Pages
-
Argus
12 Pages
-
MULTISCAN Lab
2 Pages
-
LT NANOPROBE
8 Pages
-
UHV STM 1
2 Pages
-
Cryogenic STM & SFM
4 Pages
-
SPHERA
8 Pages
-
NanoSAM Lab
6 Pages
Archived catalogs
-
VT SPM
11 Pages
-
LT STM_2017
16 Pages
-
ESCA+_2010
8 Pages
-
VT SPM_2012
20 Pages
-
LT STM_2012
16 Pages
-
SPM PROBE
2 Pages
-
MATRIX SPM Control System
8 Pages
-
MS5 & Control Unit
2 Pages
-
EFM 2
8 Pages
-
EKF 1000
2 Pages
-
SPECTALEED
8 Pages
-
CMA 100
4 Pages
-
NanoESCA
8 Pages
-
Multiscan STM
2 Pages