Overview: The document details EFM evaporators by Omicron NanoTechnology GmbH, designed for ultra-pure submonolayer and multilayer thin film growth. These evaporators are versatile for various materials and offer precise deposition control.
Specifications: EFM evaporators operate between 160°C and 3300°C, featuring an integrated flux monitor for real-time deposition rate control. They include water cooling to maintain ultra-high vacuum conditions and minimize pressure rise.
Models and Features:- EFM 2: Basic model without shutter and flux monitor, cost-effective and upgradeable.
- EFM 3: Includes flux monitor, integrated shutter, and rear-loading, suitable for thin film growth and molecular beam epitaxy.
- EFM 3i: Ion-Beam-Assisted Deposition with ion suppression and integrated gas inlet for ion generation.
- EFM 4: Designed for larger substrates up to 50 mm, with high evaporation rates and effective water cooling.
- EFM 6: Suitable for large-scale evaporation with a crucible capacity of up to 10 cm3.
- Triple EFM: Features three independent cells for compound growth without crosstalk.
Crucibles: Various crucible materials and sizes are available, including tungsten, tantalum, alumina, and more, to accommodate different elements and quantities of evaporant.
Electronics & Software: The EVC 300 and EVC 1200 power supplies offer microprocessor control, automatic flux regulation, and remote operation via "EPITASS" software. The EVC 100 is a cost-effective alternative without automatic flux regulation.
Applications: EFM evaporators are ideal for high-purity evaporation in ultra-high vacuum conditions, suitable for materials like Fe, Co, Ni, Pt, Ag, Au, Al, Mo, Ta, W, and semiconductors like silicon.
Contact Information: Omicron NanoTechnology GmbH provides contact details for offices in Europe, America, Asia, and Australia for further inquiries and support.
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