New Etching Options
2Pages

For perfect etching results An etching speed increased by up to 25 %, line/space structures of less than 50 Um and etching factors greater than 6: The New Etching Options (NEO) enable a perfect etching process with qualities that were considered unachievable until recently. For both differential etching and conductor track etching. Existing SCHMID CombiLine and PremiumLine etching modules can be retrofitted. ■ Etching with CuCl2 of line/space < 50 Um ■ Steep conductor edges: e.g. copper layer 23 Um ; etching factor > 6 ■ Uniform differential etching: copper removal 40 Um ; StDev < 0,90 ■ CpK > 1,60

NEW ETCHING OPTIONS (NEO) Details Vacuum Etching The vacuum etching forms the key component of the New Etching Options. To minimize the puddling effect suction lances are installed between the nozzle pipes which take up the used etching medium and lead it into the module tank. Powerful vacuum blowers generate constant vacuum. Unlike with water jet pumps the vacuum never collapses - no matter whether the height-adjustable suction lances take in used etching medium or false air. The result is an absolutely uniform etching rate and less chemistry consumption. Nozzle Configuration Maximum...