Edge Isolation + PSG Etching Single-sided edge isolation for maximum efficiency The Edge Isolation + PSG Etching Inline System fully automatically achieves a perfect edge isolation. The transport system developed by SCHMID especially for edge isolation ensures low chemistry consumption. In combination with the patented water mask the emitter is optimally isolated.

Expect Solutions Details Technical Data Throughput: ■ 3,600 wafers/h (5 tracks) ■ 7,200 wafers/h (10 tracks) ■ Further throughputs configurable Wafer Size: ■ 156 - 161,7 mm Breakage rate: ■ < 0,1 % Process media: ■ HF ■ KOH ■ HNO3 Automation: ■ Optional Loader and Unloader The Edge Isolation + PSG Etching Inline System combines several process steps in one system with modular design. On the one hand the emitter layer on the rearside of the wafer generated during the diffusion process is unilaterally isolated from the front side of the wafer in order to prevent malfunction of the solar cell. On...