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APCVD

Product catalog summary

Overview: The 5500 Series APCVD System is designed for cost-effective, high-volume processing of substrates with single or multi-layer thin films. It features an in-line system design ensuring uniform process treatment for each substrate, offering energy-efficient and economical performance.

Benefits:

Ideal for boron doping of n-type solar cells.
Low cost of ownership due to minimal facility requirements.
Easy maintenance with push-button interior access.
Compact design with a small footprint.
Proven effectiveness in mass production.
Advanced HMI with profiling, data logging, and touchscreen interface.

System Features: The APCVD System includes multiple injector heads in series to enhance throughput, uniformity, and flexibility while reducing costs. The HMI allows for easy monitoring and control of process parameters. The system's design facilitates cleaning of chemical injectors and exhaust ducting without major process interruptions. Modular injector head assemblies enable quick installation and removal.

Energy Efficiency: The system offers a low-cost alternative for film deposition, heating only the substrate during processing to reduce electricity and cooling needs. It features three tiers of graded insulation for additional energy savings. Available in belt or roller transport configurations, each with distinct advantages.

Technical Specifications:

Dimensions: 3.3 x 1.9 x 2.3 m (roller transport).
Deposition Chamber Configurations: Roller transport with 2 chambers; Belt transport with 3 or 5 chambers.
Loading Capacity: 156 - 161.7 mm c-Si wafers, with 5 tracks for roller transport and 4 for belt transport.
Throughput: 1,450 – 4,500 wafers per hour, depending on film thickness.

Applications: Suitable for undoped SiO2 (USG), boron doped SiO2 (BSG), phosphorous doped SiO2 (PSG), and TiO2.

Contact Information: For more details, visit www.schmid-group.com or email [email protected].

Catalog excerpts

APCVD System Low cost in-line deposition of thin films The 5500 Series APCVD System is well suited for continuous low cost high volume processing of substrates requiring single as well as multi-layer thin films. SCHMID’s in-line system design assures that each substrate receives the same process treatment. The energy efficient precision film deposition provides unequaled economical performance.

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Expect Solutions Details The production proven APCVD System from SCHMID includes multiple injector heads in series to maximize process throughput, uniformity, and flexibility while minimizing cost. The world class HMI allows the customer to easily monitor and control all process parameters in a user-friendly touchscreen environment. The maintenance-conscious design allows chemical injectors and exhaust ducting to be cleaned while in place on the system and without significant process interruption. Modular chemical vapor injector head assemblies allow quick and easy installation and removal from...

Open the catalog to page 2

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.

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