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Photolithography Patterned Optics

Photolithography Patterned Optics

Product catalog summary
Introduction
Reynard Corporation offers custom photolithography services for manufacturing patterned optics. These services utilize a contact exposing technique capable of achieving geometries as small as 5 microns with various thin film coating materials, including metallic and dielectric options, tailored to specific opto-electrical requirements.
Specifications
The patterned optics can be applied to most substrate materials, including plastic sheeting, and can accommodate substrates up to 18 inches in diameter.
Applications
  • Electro-magnetic Interference (EMI) Elimination: Utilizes conductive metal coatings designed for maximum protection at specified frequency bands while maintaining high transmission in the visible range. This is used in high-performance aircraft windows.
  • Heated Windows: Conductive patterns serve as heating grids connected to bus bars, heating up when exposed to low-voltage, high-current sources. Applications include high-altitude anti-tank missile windows and endoscope tips in the medical market.
  • Wideband Beamsplitters: Features evenly distributed patterns of transmission holes or blocking dots to split energy from UV to Far IR. The energy split can be adjusted by altering the ratio of transmission to blocking regions.
  • Other applications include encoder disks, LCD displays, bar codes, reticles, transducers, and precision reference targets.
Materials and Techniques
Metallic or dielectric materials are selected based on the application’s requirements for transparency, reflectivity, and conductivity.
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Catalog excerpts

Photolithography Patterned Optics-1

Custom patterned optics Reynard Corporation announces custom photolithography services to manufacture patterned optics. Our contact exposing technique can achieve geometries as small as 5 microns utilizing a variety of thin film coating materials. Metallic or dielectric materials are selected based on the application’s transparent, reflective, and/or conductive opto-electrical requirements. Patterns can be applied to most substrate materials, including plastic sheeting. Photolithography patterned optics are utilized in diverse markets and in numerous applications, such as the following: Elimination of Electro-magnetic Interference (EMI) for sensitive electro-optical systems – In this case, the coating material is a conductive metal. The size and spacing are designed for maximum protection at a specified frequency band, while providing high transmission in the visible range. This design approach is utilized in the manufacturing of high-performance aircraft windows. Heated windows to reduce or eliminate fogging in multi-atmospheric systems – The conductive patterns are used as heating grids that are connected to bus bars on two sides of the substrate surface. These windows will heat up when exposed to low-voltage, highcurrent sources. This design approach is utilized in high-altitude anti-tank missile windows, as well as in the tip of endoscopes for the medical market. Wideband beamsplitters that operate from UV to Far IR – An evenly distributed pattern is made of many small transmission holes or blocking dots to split the energy of the radiating source. An even split of energy is achieved when the density of the transmitted region matches the density of the blocked region. The split in energy can be changed by changing the ratio of the transmission region to the density of the blocking region. Other applications include: Encoder disks, LCD displays, bar codes, reticles, transducers, and precision reference targets. Substrates to 18” diameter can currently be accomm

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