™ precision optical solutions Think REO Covering the full spectrum of your photonics needs. Broadband Mirrors for Ultrafast Lasers These high reflectors support very broadband operation in Ti:S ultrafast lasers, and are primarily intended for use intracavity and in pulse compressors. In particular, these mirrors offer high reflectivity (>99.7%) from 650 nm to 1100 nm, as well as minimal group velocity dispersion (GVD) and third order dispersion (TOD), thus enabling near transform-limited pulse performance over the entire Ti:S tuning range. Coatings for these optics are fabricated utilizing ion beam sputtering (IBS). This technology delivers the refractive index and layer thickness precision necessary to reliably meet both performance and GVD/TOD specifications, and also produces a fully densified film with exceptional long term environmental stability. These high reflectors can be designed for operation anywhere in the 0° to 45° angle of incidence range, and are typically supplied on fused silica substrates over the 0.25" to 3" diameter range. Nominal surface flatness for these mirrors is λ/10 at 632.8 nm, and surface quality is 10-5. REO can also readily customize the center wavelength, bandwidth and dispersion characteristics of these coatings, and can fabricate these mirrors on a broad range of custom substrate materials and sizes. This type of high performance, broadband optics are key to enabling the next generation of widely tunable ultrafast laser oscillators for demanding applications such as multi-photon excitation microscopy, seeding terawatt amplifiers, and CEP-stabilized systems. In particular they support the new generation of one-box laser oscillators where wavelength tuning and other output parameters are adjusted in a simple push-button operation rather than by physically exchanging cavity optics with limited bandwidth. Reflectance vs. Wavelength 100.0 Typical Specfications Design wavelength range 650 nm to 1100 nm Reflectivity 99.7% Surface flatness (@ 633 nm) λ/10 Surface quality 10-5 or better Size range 0.25" to 3" Clear Aperture 99.9 Fused Silica and others 90% Reflectance (%) Substrate Material 99.8 99.7 99.6 99.5 650 700 750 800 850 900 950 1000 1050 1100 1050 1100 Wavelength (nm) Group Velocity Dispersion vs. Wavelength Third Order Dispersion vs. Wavelength 5000 100 GVD (fs2) 200 TOD (fs3) 10000 0 -5000 -10000 650 700 750 800 850 900 Wavelength (nm) 950 1000 1050 1100 0 -100 -200 650 700 750 800 850 900 Wavelength (nm) 5 5 0 5 A i r p o r t B l v d . B o u l d e r, C O 8 0 3 0 1 U S A | 3 0 3 . 9 3 8 . 1 9 6 0 | t h i n k r e o . c o m 950 1000