Molybdenum Rotary Sputtering Targets
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High Performance Molybdenum Rotary Sputtering Targets PLANSEE offers sputtering targets that improve the performance of thin film absorber layers. Our molybdenum rotary sputtering targets combine optimized target geometries and material properties for an efficient coating process and the best sputtering results. They are used in a wide range of applications, such as flat panel displays, photovoltaics and large area coatings. With our materials and application expertise and state of the art processing technologies we are the leading supplier for CIGS producers and major OEMs, including Von Ardenne, Leybold and Applied Materials. Application fields: - Back contact in thin film solar cells - Fully dense material because of special - Electrode material for TFT-LCD metallization deformation processes - Adhesion and barrier layer for Al- and Cu-metallization - Higher usage rates than planar targets - High thermal conductivity Properties of molybdenum rotary sputtering targets Density (at 20°C) Purity  (without tungsten) Target material thickness Target length Microstructure typical: 10 to 15 mm monolithic or bonded on backing tube up to 4 m fine grained, uniform (stress relieved)

High usage rates Rotary targets provide double or even triple the material utilization of planar targets. Rotary monolithic versions hold the record: they maintain their stability even after target utilization of more than 75 %. High thermal conductivity Monolithic targets contribute to greater productivity and improved efficiency for a faster coating process. Without a low-melting bonding layer, monolithic targets allow the highest heat transfer rates. Monolithic rotary targets can be run with up to 30 kW/m Thin Film Resistivity [µΩcm] Dynamic deposition rate [nm m/min] Mo cylindrical...