Advanced Sputtering Targets for OEM Coating Equipment
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n s he ositio tc e re ba omp v c cti mo ffe % ing t e oa st 40 c o - C p to tent - U onsis -C Advanced Sputtering Targets for OEM Coating Equipment Sputtering Targets for OEM coating equipment PLANSEE is a leading sputtering target manufacturer for hard coating applications. The product portfolio includes all typical OEM target dimensions in many compositions. TiAl, AlCr, Cr, Ti, TiSi, Ceramics (TiB2, WC/C, SiC/C, TiC/C, B4C/C...) and R&D-materials are produced in-house. Extensive research and development has resulted in highly efficient design and material innovations. Through a couple of years of intensive testing, PLANSEE has never experienced damage to any PVD equipment, leading back to an exchange of the target materials. All our efforts are aimed at enhancing the performance of our customer’s supply chain. Single source provider PLANSEE offers the complete range of production consumables needed for state-of-the-art sputtering processes, from sputtering targets to graphite foils and screws. Guaranteed availability PLANSEE stands for represents. As an independent partner for the industry, we continually invest in new technologies and machines. Supported by a worldwide production and sales network, we keep pace with the growing demands for high performance coating solutions.

Powder metallurgical Al-based sputtering targets PLANSEE products deliver outstanding benefits to our customers. Products are manufactured by powder metallurgical (PM) production routes: This opens new horizons for PVD coating. - Higher production throughput due to higher deposition rates Cost effectiveness due to improved target utilization Improved material homogeneity and flexibility in compositions Single source provider of sophisticated targets (R&D) 1. Higher production throughput PLANSEE‘s innovative monolithic target design based on a homogeneous powder metallurgical distribution of...

Maximum flank wear, vb4 (µm) Analytical characterisation of existing OEM TiAlN coatings vs. coatings deposited with PLANSEE targets showed similar results regarding crystallographic phases (and their intensities), morphology, hardness as well as adhesion of the coatings. By making iterative test coatings with diffe- rent target compositions, PLANSEE has been able to adapt the powder metallurgical targets in a way that they meet the OEM coating composition and coating performance. 40 PLANSEE targets OEM targets Machining tests OEM vs. PLANSEE finishing of 1.7220, cutting speed 290 m/min...

3. Material homogeneity and flexibility in compositions PLANSEE PM production route allow outstanding homogeneity and flexibility in target compositions. Sophisticated target compositions enable PLANSEE customers to generate outstanding coating characteristics. The microscopic mixtures of Ti and Al powders offer excellent homogeneity in a very The macroscopic arrangements of Ti plate and Al inserts in different configurations wide range of compositions. allow only a very limited range of compositions. The combination of the highly flexible PM production route with PLANSEE‘s deep product...

4. Single source provider PLANSEE Composite Materials located in Lechbruck, Germany has its expertise in the production of different metal and ceramic based composite materials. Our in-house production allows customers to choose PLANSEE as a single source for customized target compositions. Specific accessories (target clamping systems, graphite foils and screws) are available as well. Based on a long history of target development, PLANSEE shares a broad knowledge of target compositions and target designs with the customers. Coating parameters and fixing instructions for the use of PLANSEE...

TiAl-based sputtering targets Through intensive testing and analysis, coupled with our extensive knowledge of sputtering processes and control, PLANSEE has identified PM compositions that replicate OEM performance. Now PLANSEE offers PM targets for a simple substitution of the OEM targets, using a similar code for target description. Such standard materials can be offered from stock as listed below: - TiAl PM (20) - TiAl PM (48) - TiAl PM (48GM) - TiAl PM (60) - TiAl PM (70) - TiAl PM (76) - TiAl PM (76GM) - TiAl PM (92) - TiAl PM (100) - Customized compositions Due to the OEM target...

AlCr-based sputtering targets Similar positive effects noticed for the TiAl-system can also be observed for the AlCr-system. Up to now there is no industrialized OEM AlCrN coating on the market. Due to comparable restrictions regarding the target composition of OEM insert targets (seen for TiAl-system), customers cannot access these types of coatings easily. PLANSEE has a wealth of knowledge on AlCr targets for arc evaporation. Applying this knowledge to sputtering technology, PLANSEE customers will have a great opportunity launching their own AlCrN coating within a short time. We would be...

TiSi sputtering targets Due to a licensing agreement, customers who are using PLANSEE TiSi targets are free to produce any TiSiN coatings which are covered under Japanese Patent - JP3765475 (Hitachi Metals). For applications like dry high speed cutting of high performance materials, PLANSEE recommends the use of TiSiN coatings. High hardness and highest oxidation resistance of TiSiN nanocomposites lead to extended tool lifetime. PLANSEE offers a range of TiSi targets in standard compositions that are produced as single pieces from bulk material. On customer request PLANSEE also produces...

PLANSEE offers 2 types of Cr targets. - The traditional target consists of 5 mm thick Cr tiles which are bonded (indium) on a copper backing plate (5 mm). This construction limits the power levels to ~4 kW for 88 x 500 mm targets. - For applications which require higher deposition rates, PLANSEE has developed an innovative target fixture system. It is a monolithic Cr target which is mounted only with a central clamping bar. This allows thermal expansion of the target, avoids local stresses and therefore minimizes the risk of cracks on the Cr target. Monolithic targets can be utilized for...