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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications.

A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications.
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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 1

A4 Series Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. PFEIFFER p-VACUUM

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 2

Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. Full range of green dry process pumps for harsh duty applications from 100 to 3,000 m3/h Harsh duty processes in semiconductor production always provide new challenges for vacuum pumps. Based on the proven and energy efficient multi-stage Roots technology, the A4 series offers a wide range of dry pump solutions, with different pumping speeds from 100 to 3,000 m3/h. The new A 3004 pump extends the range as the high capacity solution for emerging deposition or etch applications. New XN models...

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 3

Customer benefits ■ High energy efficiency thanks to multi-stage Roots technology, high efficiency motors and limited use of electrical heaters ■ Wide operating temperature range protects the pump against precursor cracking or condensable deposition ■ Full corrosion resistant materials for increased lifetime ■ High MTBF and low cost of ownership ■ High particle tolerance increases tool uptime ■ Extended monitoring functionalities provide better control of pump conditions (water sensor, vibration box) ■ Integrated hot N2 injection prevents exhaust clogging ■ IP33, Semi S2 and UL compliant...

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 5

Pumping speed Pumping speed A 124 H, A 604 H, A 1204 H For non-critical applications A4H Series - Pumping speed without N2 purge - 60 Hz 104 A4H/X Series - Pumping speed A124H without N2 purge - 60 Hz A 804 XN, A 1504 XN, A 1804 XN, A 3004 XN For very corrosive applications A1504H/X A804H/X A4XN Series - Pumping speed without N2 purge - 60 Hz

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 8

Maximum peak pumping speed N2 at 50 Hz m3/h 95 130 11 Subject to pump T° setting

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 9

Maximum peak pumping speed N2 at 60 Hz Maximum ultimate pressure (No Purge) at 60 Hz Maximum ultimate pressure (50 SLM Purge) at 60 Hz hPa Maximum continuous inlet flow at full rotational speed slm Power supply Power consumption at ultimate pressure, no exhaust heater at 60 Hz Maximum exhaust overpressure Water connect Operating temperature Inlet flange Exhaust flange Dimensions Length (to exhaust flange) Height (to inlet flange) Maximum vibration level at pump inlet flange Maximum noise level (at ultimate pressure) 2) Provisional 3) Subject to pump T° setting

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 10

Order number guide and matrix Rootsblower by-pass Inlet flange connection Roots blower temperature management Functional block temperature management Pump model Order number guide A4 series

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 11

Order number matrix A4 series Order number Harsh Corrosive Very corrosive – Full Ni coated Pump model Functional block temperature management Standard version Cold version Roots blower temperature management Standard version Cold version Inlet flange connection Roots blower by-pass With standard by-pass Water sensor Large volume version: A 124 and A 604: max. 5 m3 chamber volume. A 204, A 804, A 1504, A1804, A 3004: max. 50 m3 chamber volume I-HN option requires specific exhaust line configuration – Please consult Pfeiffer Vacuum SAS, Fran

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A4 Series - Energy-efficient dry multi-stage Roots process pumps for all semiconductor and coating applications. - 12

vacuum solutions from a single source Pfeiffer Vacuum stands for innovative and custom vacuum solutions worldwide, technological perfection, competent advice and reliable service. complete range of products From a single component to complex systems: We are the only supplier of vacuum technology that provides a complete product portfolio. competence in theory and practice Benefit from our know-how and our portfolio of training opportunities! We support you with your plant layout and provide first-class on-site service worldwide. Are you looking for a perfect vacuum solution? Please contact...

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