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A 200 L - Multi-stage Roots Pumps

A 200 L - Multi-stage Roots Pumps

A 200 L - Multi-stage Roots Pumps

Product catalog summary
Overview: The A 200 L is a multi-stage Roots pump designed for light duty processes, offering the highest throughput in the integrated pump market. It is particularly suitable for load lock applications, transfer chambers, SEM, PVD processes, and cryogenics gas recovery.
Specifications: The pump provides a peak pumping speed of 200 m3/h and can handle up to 300 pump downs per hour on a 20-liter load lock chamber. It operates with a low base pressure and consumes only 0.7 kW at base pressure, making it energy-efficient.
Design and Integration: The A 200 L is compact, with a footprint of less than 0.17 m2, allowing easy integration into existing systems. It features a flexible inlet position and is 100% interchangeable with the A 100 L model, requiring no equipment modifications for upgrades.
Performance and Benefits: The pump offers top performance with unrivaled throughput, low noise and vibration levels, and high cleanroom compatibility. It includes an integrated self-monitoring system and requires no on-site preventive maintenance.
Technical Data: The pump supports power supply voltages of 200-230 V and 380-480 V, with a maximum noise level of less than 58 dB(A). It has a typical vibration level at the inlet flange of less than 0.14 g and requires cooling water flow between 100 to 200 l/h.
Applications: The A 200 L is suitable for wafer processing, physical vapor deposition (PVD), and cleanroom environments.
Ordering Information: The pump is available with or without RS-232/RS-485 interfaces, with specific order numbers provided for each configuration.
Company Information: Pfeiffer Vacuum offers a complete range of vacuum solutions, from single components to complex systems, with a focus on innovation, technological perfection, and reliable service.
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Catalog excerpts

A 200 L - Multi-stage Roots Pumps-1

A 200 L Multi-stage Roots pump for light duty processes with the highest throughput in the integrated pump market

 Open the catalog to page 1
A 200 L - Multi-stage Roots Pumps-2

Top performance The new A 200 L guarantees highest throughput for load lock applications thanks to a 200 m3/h peak pumping speed, a low base pressure and its suitability for heavy duty cycles. As an illustration: The A 200 L is compatible with a cycle rate of up to 300 pump downs per hour on a 20 liters load lock chamber, which is over three times the maximum cycle rate of the 100 m3/h class A 100 L. The A 200 L is also suitable for other light duty applications -from the use in transfer chambers over SEM and PVD processes up to preclean chambers. He also can meet gas recirculation requirements...

 Open the catalog to page 2
A 200 L - Multi-stage Roots Pumps-3

Pumping speed Technical data Pump down curves on 20 liters Peak pumping speed Typical pump down time to 300 mTorr, 20 liters chamber Max. ultimate pressure Power supply voltages Power consumption Max. cycling frequency (20 l volume) Max. continuous inlet flow Max noise level at full speed Typical vibration level at inlet flange 10 - 1,000 Hz Cooling water Cooling water connection Dimensions l x w x h Weight Ambient temperature Inlet/exhaust size Tool interface RS-232/485 interface Variable speed Stackable 11 Ultimate pressure 2) Cycle dependent 3) Horizontal inlet only 200 m3/h 6.0 s 1 ■ 10-2...

 Open the catalog to page 3
A 200 L - Multi-stage Roots Pumps-4

VACUUM SOLUTIONS FROM A SINGLE SOURCE Pfeiffer Vacuum stands for innovative and custom vacuum solutions worldwide, technological perfection, competent advice and reliable service. COMPLETE RANGE OF PRODUCTS From a single component to complex systems: We are the only supplier of vacuum technology that provides a complete product portfolio. COMPETENCE IN THEORY AND PRACTICE Benefit from our know-how and our portfolio of training opportunities! We support you with your plant layout and provide first-class on-site service worldwide. Are you looking for a perfect vacuum solution? Please contact us:...

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