PSHdSOHIG Plasma Processing Equipment I The APX 300 contributes to high-level productivity in the etching process thanks to high speed LED film processing I The LED substrate surface can be etched to diverse shapes such as trapezoidal and conical form > Housing the equipment in one box contributes to increased area productivity "1 : For other size wafers, please contact us *2 : 2 line 3-phase power source, and this shows the total

Advanced ICP and Multi-ESC realize high accuracy & high productivity IMSCCMultl Spiral CoiOlCP Quartz plate High Efficiency Good Uniformity Multi number of wafers with Direct cooling APX300 can be used for Plasma Dicing Blade Dicing Our Solutions, Your Value Sapphire processing High productivity for Hard fabrication material _ Panasonic Group products are built with the environment in mind. Panasonic Group builds Environmental Management System in the factories of the world and acquires the International Environmental Panasonic Factory Solutions Co.,Ltd. Micro Electronics Division 2-7 Matsuba-cho,...