OAI is a Silicon Valley-based manufacturer of advanced prcision equip ment for the MEMS, Semiconductor, Nanotechnology, Microfluidics, Micro TAS and Flat Panel industries. The company offers a broad portfolio of field-proven products that include: mask aligners, UV exposure systems, UV light sources, nano imprint modules, wafer bonders, UV ozone surface treatment systems, edge bead exposure systems, wafer sorters, clean room conveyors and numerous, custom-engi MEMS Microfluidics/Micro TAS Semiconductors Flat Panel Display i ~i Automation Systems neered solutions. These products deliver exceptional performance, high satility with excellent reliability. Based on a proven platform of modularized subsystems, many of these advanced tools can be ustom configured to meet your specific requirements. With over 35 years of experience, and thousands of systems and instruments in use around the world, OAI has earned a reputation for exceptional roducts and superior customer support. Custom Solutions By using a modular approach to product development, OAI can customize systems to meet the specific requirements of each individual customer. Nano Imprint

MEMS Prcision Equipment for R&D or Production Model 200IR Mask Aligner System Front and Backside IR Mask Aligner System. ■ Entry level price point ■ Flexible design for easy change of wafer and mask holder ■ Accommodates substrate up to 8" ■ PLC controlled ■ Filter holder and a wide range of filters available Model 800 MBA Mask Aligner System Semi Automated Optical Mask Aligner with Front and Backside Alignment. For use in R&D and low volume production applications. ■ Includes anti-vibration table ■ Automated substrate planarization ■ Optical 4-camera front and backside alignment ■ Flexible design...

Microfluidics and Micro TAS CLiPP Fabrication: Methodology for Microfluidic Prototype and Production Devices Model 200 Mask Aligner System Manual, table top Contact Mask Aligner. Flexible - fast, easy change of substrate & mask holder Substrates up to 8" Entry level price point Available with near, mid and deep UV Optics and holders available for small substrates Can be configured with an OAI CLiPP microfluidic module Filter holder and a wide range of filters available Fill chamber with monomer mixture. Fill channels with sacrificial material Adjust cavity for subsequent layer Add binary photomask...

Semiconductors ▲ Model 200 Mask Aligner System Manual, table top Contact Mask Aligner for Universities and R&D. ■ Flexible - fast, easy change of substrate and mask holders ■ Substrate sizes up to 8" ■ Entry level price point ■ Available with Near, Mid and Deep UV ■ Special optics and holders for small pieces and substrates ■ Available with optional back side IR alignment ■ Optional Nano Imprint Module available ▲ Model 500 Mask Aligner System Semi-automatic Contact Mask Aligner for R&D as well as low volume production. ■ Integrated frame and vibration isolation ■ Available with Near, Mid and...

Flat Panel Display Nano Imprint Nano Imprint Technology (NIL) ► Model 600 Large Area Aligner System Contact / Proximity Aligner. ■ Accommodtes substrate sizes up to 20"x20" ■ Flexible design allows small to large substrates to use the same tooling ► Lightsource Grande Large Area, Collimated UV Lightsource ■ Power up to 10KW ■ Accommodates a full range of large sizes utilizing collimating mirrors ▲ Automation Model 5000E Mask Aligner System Fully automated mask aligner system with precision automatic large area alignment and advanced pattern recognition. ■ True proximity, hard, soft & vacuum contact...

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