pimfc-LDds
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Flow Measurement & Control πMFC – Low Pressure MASS FLOW CONTROLLER FOR ION IMPLANT APPLICATIONS The PFC-20, Low Pressure πMFC mass flow controller provides maximum utilization of Safe Delivery Source gases. Implementation of the Low Pressure πMFC increases tool uptime by reducing the frequency of source gas cylinder changes. It offers accurate and precise control of low gas flows over a wide pressure range with source gas delivery pressure as low as 4 Torr. This πMFC is the latest in MKS products designed specifically for SDS and VAC® source gases serving the ion implantation industry. The patented valve and sensor designs offer exceptional zero stability and accuracy for all flow conditions while maintaining the ability to rapidly achieve setpoint and repeatably control the gas flow. Standard-sized MFC footprint and control I/O are compatible with existing gas lines for easy integration and operation. Features & Benefits • Maximizes SDS source gas utilization reducing bottle changes resulting in higher tool uptime and lower cost-of- ownership • Repeatedly controls low gas flows allowing for reduced gas consumption using parameters optimized for implanter source applications • Digital control loop provides rapid response to setpoint minimizing process cycle time • Increases tool uptime through reduction of “No Problem Found”: MFC replacements — ncluded embedded diagnostics and I software allowing users to check MFC functionality without removing the MFC —E-diagnostics through embedded Ethernet interface allows monitoring performance parameters during operation • Direct form-fit-function replacement for most common MFCs • Reduces inventory costs through multi- gas, multi-range capability • Straightforward configuration and diagnostics through Ethernet interface — ses standard web browser – no U special software required — ncludes remote PC application I • Bright rotatable LED display provides easy viewing of flow rate, gas type, full scale flow range, temperature and Ethernet address Protected under one or more of the following U.S. patents: No. 6,668,641, No. 6,668,642, No. 6,779,394, No. 6,868,862, No. 6,810,308, No. 7,004,191 or International Patents and Patents pending.

Most gases used in the semiconductor industry are supplied at a constant pressure, typically above atmosphere, and are delivered to a process at or below atmosphere. Ion implant gases are now mostly supplied at sub-atmospheric pressure using SDS or VAC source gas technology. The πMFC multi-gas feature allows the user to configure an MFC off-the-shelf for its intended gas further lowering costs through reduced inventory requirements. This feature is enabled through a web browser utility accessed through the device’s Ethernet port. The configuration utility uses a standard web browser – no...

Specifications Performance Full Scale Ranges (N2 equivalent) Inlet Pressure Range 4 – 1200 Torr (with vacuum at the outlet) Normal Operating Pressure Differential (N2 equivalent) <10 Torr at F.S. flow (with vacuum at the outlet) Maximum Purge Pressure Burst Pressure Control Range Typical Accuracy ±1% of setpoint for >10 to 100% F.S. and ±0.2% of F.S. for 2 to 10% of F.S. at inlet pressures >20 Torr Temperature Coefficients Controller Settling Time (per Semi Guideline E17-0600) <2 sec. typical above 10% of F.S. at inlet pressures >10 Torr Warm-up Time <30 min. (to within 0.2% of F.S. of...

Ordering Inf ormation Ordering Code Example: P2A035500RAT2 Type πMFC Mass-Flo Controller (multi-gas, multi-range) Nitrogen = N2 Arsenic Pentaflouride = AsF5 Arsine = AsH3 Boron Triflouride = BF3 Germanium Tetraflouride = GeF4 Hydrogen Selenide = H2Se Phosphine = PH3 Phosphorus Triflouride = PF3 Silicon Tetraflouride = SiF4 Based on 100% gas concentration, for other gases or mixtures, consult factory. Flow Range Full Scale* 2 sccm 5 sccm 10 sccm 20 sccm Fittings Swagelok 4 VCR male Valve Normally Closed, Teflon® T Flow Orientation Vertical Flow Horizontal Flow *The Full Scale Flowrate is...