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Mask Alignment Tools
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214 Phone: 1-800-222-6440 • Fax: 1-949-253-1680 L i g h t S o u r c e s TECHNICAL REFERENCE MONOCHROMATOR AND INCANDESCENT SOURCES ARC SOURCES DEUTERIUM SOURCES CALIBRATION SOURCES FIBER ILLUMINATORS PHOTOLITHOGRAPHY SOLAR SIMULATORS INSTRUMENTS ACCESSORIES FOR ORIEL LIGHT SOURCES Oriel Mask Alignment Tools Mask Aligment Fixture and Flood Exposure Source To build a complete photolithography system, you need the following four components in addition to the exposure source (which we describe on page 218): • Mask Alignment Fixture • Substrate or Wafer Holder • Photomask Holder • Precision Slide In very simple terms, the assembly resembles a movable waffle iron with micrometer adjustments. The base is the Mask Alignment Fixture, which provides X-Y-Z positioning of the "waffle." The waffle, or substrate, rests on top of the fixture in a Substrate Holder; and lastly, the lid is a Mask Holder with mask in place, which closes down over the substrate. With the substrate loaded and aligned to the mask, the assembly is manually moved into position for exposure under the collimating lens of the Illumination Source using a Slide. Exposure occurs by opening and closing the light source shutter. After exposure, the assembly is returned to its starting location for removal of the substrate. MASK ALIGNMENT FIXTURE SUBSTRATE WAFER HOLDER PRECISION SLIDE PHOTOMASK HOLDER Fig. 1 Four components of a basis Photolithography System. Mask Alignment Fixture The 83210-V is a fixture, which holds one mounted substrate (or wafer) and mounted mask holder for each size of substrate (substrate and mask holders must be purchased separately). It accommodates substrates from 1 x 1 inch (25.4x25.4 mm) up to 6 x 6 inches (152.4x152.4 mm) and corresponding masks from 2 x 2 inches (50.8x50.8 mm) up to 7 x 7 inches (177.8x177.8 mm). Change substrate sizes with a simple interchange of substrate and mask holders. Use the vacuum contact mode for moderate resolution of image features 2 microns in dimension. If mask wear is a concern, operate in the proximity printing mode with a resolution of 25 microns. Substrate or Wafer Holder Our substrate and wafer holders have vacuum hold down that holds them in place during alignment and exposure. Substrate holders use three hardened steel pins for coarse alignment. The wafer holders have two flats, which mate to the flats on the wafer for coarse alignment. These holders hold substrates or wafers from 1 x 1 inch (25.4x25.4 mm) up to 6 x 6 inches (152.4x152.4 mm) with a maximum thickness of 0.25-inches (6.35 mm). Custom sizes, e.g. a wafer holder to position both a 4-inch (101.6 mm) OD and 5-inch (127 mm) OD wafer to a 6-inch (152.4 mm) mask, are available upon request. Contact a Sales Engineer with your requirements.

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L i g h t S o u r c e s 215 Email: [email protected] • Web: newport.com TECHNICAL REFERENCE CALIBRATION SOURCES DEUTERIUM SOURCES ARC SOURCES INCANDESCENT SOURCES MONOCHROMATOR AND FIBER ILLUMINATORS SOLAR SIMULATORS PHOTOLITHOGRAPHY INSTRUMENTS ACCESSORIES FOR ORIEL LIGHT SOURCES Photomask Holder Photomask holders have a frame that mates to the top and sides of the mask while the bottom of the mask rests on a closed cell neoprene gasket. During vacuum contact, the mask and substrate are pulled together. Masks up to 0.25-inches (6.35 mm) thick are held mechanically against three hardened steel...

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216 Phone: 1-800-222-6440 • Fax: 1-949-253-1680 L i g h t S o u r c e s TECHNICAL REFERENCE MONOCHROMATOR AND INCANDESCENT SOURCES ARC SOURCES DEUTERIUM SOURCES CALIBRATION SOURCES FIBER ILLUMINATORS PHOTOLITHOGRAPHY SOLAR SIMULATORS INSTRUMENTS ACCESSORIES FOR ORIEL LIGHT SOURCES CHOOSE A LIGHT SOURCE DUV (220-260nm) MUV (260-320nm) NUV (350-450nm) CHOOSE BEAM SIZE (2X2 TO 10X10) CHOOSE IRRADIANCE (500 OR 1000W) CHOOSE BEAM SIZE (2X2 TO 10X10) CHOOSE IRRADIANCE (500 OR 1000W) CHOOSE BEAM SIZE (2X2 TO 10X10) CHOOSE IRRADIANCE (500 OR 1000W) CHOOSE LIGHT SOURCE ACCESSORIES DIGITAL EXPOSURE CONTROLLER...

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Ordering Information We recommend that you contact a Sales Engineer before ordering a complete Photolithography System, to review your requirements. Mask Alignment Fixture Substrate Holders The substrate holder must be 1-inch smaller than the corresponding mask holder; e.g. 3-inch OD substrate requires a 4 x 4 inch mask. At order placement, specify thickness of substrate. Tolerance is ±0.0075 inches. If thicknesses vary by more than 0.010 inches, separate holders are required for each thickness. Custom sizes are available. Wafer Holders The wafer holder must be 1-inch smaller than the corresponding...

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Mask Alignment Tools 1 /4Pages

Mask Alignment Tools 1 /4Pages

Catalog excerpts

All MICRO-CONTROLE / Spectra-Physics catalogs and technical brochures

Archived catalogs

Mask Alignment Tools
1 /4Pages

Mask Alignment Tools
1 /4Pages