Dynamic mixtures applied on Deposition techniques
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MCQ Gas Blender 100 Series High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface www.mcqinst.com Gas Blender 100 Series Application Note 1/4 Introduction Over the last 20 years, Chemical Vapor Deposition (CVD) processes has taken a key-role in a wide range of technological advanced manufacturing. Today the industrial processes for anti-wear cutting tools coating and microprocessor production share the same deposition techniques, proving a constant self-developing process that is extremely useful and versatile. CVD is a generic name for a huge family of processes that involves the use of gaseous precursors in order to produce high-purity and high performance solid materials. The gaseous phase usually is thermally activated inside the CVD chamber by an adequate heat source to produce a chemical reaction that leads to the desired products formation, and subsequently to the products deposition on the target-substrate. CVD involves the use of hot filaments to activate reactions (HFCVD) and it also requires extremely low working pressures. Different type of heat sources (e.g. plasma, laser) have proved to be useful and now plasma-enhanced deposition (PECVD) and Laser CVD (LCVD) are of common use. Pressure is not a problem anymore since, in some applications, the Application Note deposition can be performed in atmospheric pressure (APCVD). The deposition results strongly depend on process parameters and hardware configuration settings. This strong dependence requires a fine control and a fine regulation for each step of this technique. A particularly precise care on the gas phase composed by the reactants must be exercised. An instrument capable of producing gas mixtures with high precision and designed to be versatile and easily manageable is thus required for this kind of applications. The MCQ Instruments offers it all with its Gas Blender 100 Series, a product specifically built for 3 components gas mixture. CVD applications The versatility of CVD technique(s) is proven by its use in a wide array of different research and application fields. The experimentation fields can be summarized in four main categories: thin and thick film applications, powder treatments (fluidized bed CVD) and carbon nanotubes research. Thin films This term refers to nanometers in coatings up to a few micrometers thickness, made to improve the specific performance of a base material. The synthetic diamond (CVD diamond), due to its unique chemical and physical properties, is a perfect example of thin film application. The hardness and chemical inertness of micro- and nano-crystal diamond films are generally used to increase the wear resistance of metallic/ceramic components [1,2] while single crystal diamonds take a crucial role in the making of cutting tools [3,4]. In the last 20 years CVD diamond has proved itself to be a versatile material studied nowadays for electronic applications in the radiotherapy [5] and in the MCQ Gas Blender 100 Series Application Dynamic mixtures applied on Deposition techniques A CVD chamber during the deposition process

MCQ Gas Blender 100 Series High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface www.mcqinst.com Gas Blender 100 Series Application Note 2/4 Carbon nanotubes This is one of the newest and promising CVD applications. The nanotechnologies represent the future and the last frontier of worldwide research. In this context carbon nanotubes take a key role. Made through HFCVD or PECVD, carbon nanotubes great interest is due to their peculiar features making them a unique material adaptable for many applications. Carbon nanotubes are the strongest material in term of...

MCQ Gas Blender 100 Series High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface www.mcqinst.com Gas Blender 100 Series Application Note 2/4 100 Series is a high precision 3 channels mixing device that work with non-aggressive gas media. The instrument, designed following the “Lab in a box” principle, offers the advantages of 3 single-channel mass flow controllers all in a compact box, easily to handle and to install wherever it’s needed. The Gas Blender 100 Series requires no external control unit, for all the mixture parameters and other gas settings can be...

MCQ Gas Blender 100 Series High Performance Gas flow Dilutor & Gas flow Mixing System with User Interface www.mcqinst.com Gas Blender 100 Series Application Note 2/4 review on deposition, physical properties and solar cell applications - Sol Energy Mater Sol Cells 76, 4 (2003) 431-487. [14] C.C. Allgood, Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning – J Fluorine Chem 122, 1 (2003) 105-112. [15] J. Perez-Mariano, K.H. Lau, A. Sanjurjo, J. Caro, J.M. Prado and C. Colominas, Multilayer coatings by chemical vapor deposition in a...