- Catalogs
- Logitech Limited
- CMP Tribo
CMP Tribo
CMP Tribo
- Designed for both part and full wafers up to 4”/100mm on a 400mm polishing plate.
- Recipe mode for building, saving, and recalling multi-stage processes, ensuring repeatability across operators.
- Independent settings for carrier and pad conditioner arms, allowing customization of sweep, amplitude, and force.
- Optional integration of up to four independent slurry pumps for diverse process requirements.
- Real-time process information via advanced in-situ sensors, aiding in End Point Detection (EPD) and process stability.
- Carrier sizes: 100mm/4” with templates for smaller sizes.
- Dimensions: Height - 1123mm, Width - 1382mm, Depth - 985mm.
- Power supply: 220v - 240v, 16Amps, 50/60Hz.
- Plate diameter: 400mm.
- Carrier speed: 10-100rpm.
- Slurry flow rate: 20-500 ml/minute.
- Carrier down pressure: Min 0.4psi/2.8kPa, Max 9psi/62kPa.
- Carrier back pressure: Max 50psi/62kPa.
- Touch screen interface for configuring parameters such as CoF, carrier load, and slurry delivery.
- Automated CMP process capabilities, freeing operator time.
- Chemically resistant to standard CMP chemicals, with integrated cleaning features.
Catalog excerpts
Achieve the highest possible standards of processing control with this bench-top system designed for the research of wafer processing.
Open the catalog to page 1
→→Bench-top CMP system designed with the research of wafer processes in mind with secondary applications in the field of Tribological science and research. →→ The ability to process part wafers and full wafers up to 4”/100mm on the 400mm polishing plate. The Logitech CMP Tribo is a bench-top chemical mechanical polishing (CMP) system designed with the research of wafer processes in mind, including their associated wafer, pad and slurry interactions. Primary application areas for the CMP Tribo are in the field of CMP planarization or delayering, with secondary application in the field of Tribological...
Open the catalog to page 2
TECHNICAL SPECIFICATIONS Carrier sizes available: 100mm/4” - Templates can be used to allow partial and smaller sizes. Power supply: Plate diameter: Carrier speed: Carrier down pressure: Carrier back pressure: Slurry flow rate:
Open the catalog to page 3All Logitech Limited catalogs and technical brochures
Sample Loading Gauge3 Pages
NCG-23 Pages
GI20 Flatness3 Pages
Modular Wafer Bonding System3 Pages
WSBU3 Pages
Jigs6 Pages
Fume Cabinet for CP30003 Pages
CMP Orbis3 Pages
CP40003 Pages
DP Series4 Pages
DL Series3 Pages
WG63 Pages
LP703 Pages
PM63 Pages
Akribis-air3 Pages
Optics Material Processing9 Pages
Consumable Product Catalogue12 Pages
- Cutting system
- CNC cutting center
- Knife cutting system
- Automatic sawing line
- Measuring machine
- Circular sawing machine
- Automatic cleaning system
- Precision cut-off machine
- Cut-off saw
- Sheet cutting machine
- Compact cut-off machine
- Rotary blade cutting center
- Precision saw
- Polishing unit
- Protective cabinet
- Semi-automatic saw
- Stone and concrete saw
- High-precision measurement system
- Metal polishing machine
- Glass cutting machine