CMP Orbis

CMP Orbis

CMP Orbis

Product catalog summary
Overview: The CMP Orbis is a precision-engineered, floor-standing Chemical Mechanical Polishing (CMP) system designed for research and development (R&D) environments. It is particularly suited for pilot production tests, offering production-scale results while maintaining a laboratory-scale footprint.
Key Features & Functionality:
  • Designed for R&D environments, suitable for pilot production tests.
  • Accommodates two samples up to 200mm/8” or multiple smaller samples using templates.
  • Recipe mode for building, saving, and recalling multi-stage processes, ensuring repeatability across different operators.
  • Equipped with sophisticated software for enhanced analytical and data collection capabilities.
  • Twin peristaltic pumps for controlled slurry delivery, allowing different slurries for varied processing needs.
  • Motor-driven carriers with a wafer process capacity of up to 200mm/8”.
  • Touch screen interface for configuring parameters and process conditions, including CoF, carried load, and slurry delivery.
  • Includes a CMP diamond pad conditioner for effortless pad conditioning during sample processing.
  • Motor-driven carrier heads and plate speeds up to 160rpm for faster polishing rates and greater control.
  • Chemically resistant to standard CMP chemicals, with integrated sample cleaning using de-ionised water and nitrogen gun.
Technical Specifications:
  • Carrier sizes: 100mm/4”, 150mm/6”, 200mm/8”.
  • Dimensions: Height - 1950mm, Width - 1680mm, Depth - 781mm.
  • Power Supply: 220Vac-240Vac, 25Amps, 50/60Hz.
  • Plate diameter: 600mm.
  • Carrier speed: 10-125rpm.
  • Slurry flow rate: 20-500 ml/per minute.
Applications: The CMP Orbis is adaptable for various processing uses, including back-end IC manufacturing, Micro-Electromechanical Systems (MEMS) fabrication, Opto-MEMS, and Bio-MEMS fabrication. It achieves laser-quality surfaces with Ra to sub-nanometer levels of material removal across a wide range of materials.
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Catalog excerpts

CMP Orbis-1

Achieve results typically found in production scale equipment and enhance your CMP research capabilities with this floor standing CMP tool.

 Open the catalog to page 1
CMP Orbis-2

→→Floor standing CMP tool ideally suited to R&D environments - typically used in applications which conduct pilot production tests. →→ High capacity works pace for two samples up to 200mm/8” - or multiple smaller samples through the use of templates The CMP Orbis is a precision engineered, floor standing Chemical Mechanical Polishing (CMP) system ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced process performance. →→Produces results typically seen on production scale equipment whilst...

 Open the catalog to page 2
CMP Orbis-3

TECHNICAL SPECIFICATIONS Carrier sizes available: Power Supply: Plate diameter: Carrier speed: Slurry flow rate:

 Open the catalog to page 3
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.