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IMPULSE

Product catalog summary

Overview: The IMPULSETM 2kW Pulsed Power Modules are designed for advanced magnetron sputtering applications, offering options for single or dual module configurations. These modules are suitable for powering multiple magnetron heads or providing a pulsed substrate bias with precise timing.

Options: The system includes a touch screen interface for direct parameter entry, a rear panel RJ-45 microcontroller interface, and can be paired with an upgraded magnetic pack for enhanced performance. A positive pulse kicker is available for reactive and enhanced sputtering.

Process: The modules provide an easy upgrade path for existing DC sputtering systems to achieve HiPIMS/HPPMS and reactive capabilities, utilizing existing DC power supplies as charging or bias inputs.

Applications: These modules are ideal for high-power impulse magnetron sputtering, advanced coatings in R&D applications, and are optimal for hard coatings, high-density films, and superior optical coatings. They are suitable for 2”, 3”, and 4” circular magnetrons requiring high impulse power and pulse flexibility.

Features: Key features include up to 200 A peak current capability, user-selectable pulse width, frequency, and peak current, real-time monitoring, arc detection and suppression technology, and precision timing for substrate bias or cathode synchronization. The modules are CE marked.

Specifications: The modules operate on a 1 phase, 100-240 VAC input power, with a nominal output peak voltage of -1000 V and peak current of 200 A. They feature user-adjustable peak current limiters, selectable pulse frequency and width, and external communications via RJ-45 and USB interfaces. The physical dimensions are 2U rack size, with forced air cooling for operating temperatures between +5°C to +40°C.

Performance Comparison: The document compares conventional dcMS copper deposition with IMPULSE 2-2 HiPIMS deposition, highlighting the latter's ability to produce dense, non-porous nanostructures under similar conditions.

Catalog excerpts

IMPULSE 2kW Pulsed Power Modules for Advanced Magnetron Sputtering Kurt I. Lesker Company (i PROCESS EQUIPMENT ^ DIVISION Applications • High-Power Impulse Magnetron Sputtering • High-Power Pulsed Magnetron Sputtering (HiPIMS/HPPMS) • Advanced coatings for university, industrial and governmental R&D applications • Optimal for hard coatings (ex. DLC), high density/non-porous film requirements, high aspect ratio coatings, and superior optical coatings • Ideal for 2”, 3” & 4” circular magnetrons requiring high impulse power & pulse flexibility Features • Up to 200 A peak current capability for power handling and high deposition rate • User selectable pulse width, frequency and peak current • Real-time discharge voltage and current monitoring; integrated power feedback with touch-screen control • Arc detection and suppression technology • Precision master/slave module timing for substrate bias or cathode synchronization for co-deposition • CE marked Process • Easy way to upgrade existing DC sputtering systems for HiPIMS/HPPMS and reactive capability • Use your existing DC power supply as the charging supply or bias input

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Positive KICK Kurt J. Lesker Company (KJLC) specifications and/or test data may not be copied, reproduced or referenced without express written permission of KJLC. Kurt J. Lesker Company Ltd. EMEIA - [email protected] +44 (0) 1424 458100 Enabling Technology for a Better World |www.lesker.com Kurt.Lesker (Shanghai) Trading Company Asia - [email protected] +86 21 50115900 17 11l

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IMPULSE

IMPULSE

Catalog excerpts

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