IMPULSE 2kW Pulsed Power Modules for Advanced Magnetron Sputtering Kurt I. Lesker Company (i PROCESS EQUIPMENT ^ DIVISION Applications • High-Power Impulse Magnetron Sputtering • High-Power Pulsed Magnetron Sputtering (HiPIMS/HPPMS) • Advanced coatings for university, industrial and governmental R&D applications • Optimal for hard coatings (ex. DLC), high density/non-porous film requirements, high aspect ratio coatings, and superior optical coatings • Ideal for 2”, 3” & 4” circular magnetrons requiring high impulse power & pulse flexibility Features • Up to 200 A peak current capability for power handling and high deposition rate • User selectable pulse width, frequency and peak current • Real-time discharge voltage and current monitoring; integrated power feedback with touch-screen control • Arc detection and suppression technology • Precision master/slave module timing for substrate bias or cathode synchronization for co-deposition • CE marked Process • Easy way to upgrade existing DC sputtering systems for HiPIMS/HPPMS and reactive capability • Use your existing DC power supply as the charging supply or bias input

Positive KICK Kurt J. Lesker Company (KJLC) specifications and/or test data may not be copied, reproduced or referenced without express written permission of KJLC. Kurt J. Lesker Company Ltd. EMEIA - [email protected] +44 (0) 1424 458100 Enabling Technology for a Better World |www.lesker.com Kurt.Lesker (Shanghai) Trading Company Asia - [email protected] +86 21 50115900 17 11l