EpiCentre - The Deposition Stage
16Pages

INTERNATIONAL TRADE

EpiCentre The Deposition Stage Introduction The EpiCentre range of deposition stages employs cutting edge design and engineering to give high temperature substrate heating and manipulation under true UHV conditions. EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed. EpiCentres can be mounted in any orientation to suit customer chamber designs and application configurations. The EpiCentre range...

Range Overview GLAD Series An ‘in-line’ design presenting the A ‘right-angle’ design presenting the An in-line ‘glancing-angle’ design substrate parallel to the mounting substrate at 90 to the mounting flange. presenting the substrate at a variable flange. The EC-I series provides The EC-R provides substrate rotation, glancing angle to the mounting flange. substrate heating with a number heating and electrical biasing. The two The GLAD (GLancing Angle Deposition) of proven modular options offering axes of rotation provide continuous stage is creating great interest in the field substrate...

EpiCentre Range Key Advantages Key Advantages EpiCentre range Compact, high reliability design Substrate biasing with ultra-stable plasma MAGIDRIVE Rotary Feedthroughs EpiCentre stages can be provided with the facility to apply an The EpiCentre uses magnetically coupled drives in high duty cycle areas for substrate and polar rotation. Eliminating the use of edge-welded bellows, o-ring seals and ferromagnetic components improves reliability and removes possible sources of contamination. electrical bias to control substrate deposition characteristics and to generate a plasma for substrate...

EpiCentre The Deposition Stage High uniformity, high temperature substrate heating SiC coated elements Until recently, Pyrolytic Graphite Coated Graphite (PgG) heaters have been used in the majority of deposition stages and are SiCg elements are similar to PgG elements being primarily still the mainstay in the field providing robust performance in composed of graphite but have a coating of Silicon Carbide UHV applications. However, graphite heaters oxidise and are (SiC). This provides improved durability when using oxidising consumed when run in the presence of high partial pressures...

In-line Deposition Stages Substrate parallel to plane of mounting flange • Substrate heating to 1200°C • Continuous substrate rotation up to 60rpm • ubstrate lift/lower for transfer S • DC/RF substrate biasing • Homing for automatic transfer alignment • Adjustable deposition height • EMI standard 2" to 200mm diameter substrate S handling • SiCg or sSiC heater technology • True UHV performance The EC-I series is the latest model in the very successful range The stationary heater module employs multiple refractory metal of EpiCentre stages, providing state-of-the-art performance Molybdenum...

EpiCentre The Deposition Stage Twin, height adjustable K-type thermocouples or single fixed height C-type 2 pin type power feed through for heater HN type RF feed through for bias Pneumatic actuator for cradle height motion (manual option available) MagiLift combined rotary/linear magnetically coupled drive CF300 conflat mounting flange with 4 x CF38 service ports for shutters, feed throughs and other ancillaries Sheilded RF/DC bias connection Stationary refractory metal heater module (no rotating contacts) Rotating cradle for substrate support

Stage Configuration: EC-I Series STANDARD CONFIGURATION Substrate diameter Heater element Silicon Carbide coated graphite (SiCg) as standard (see options below) Substrate rotation Stepper motorised Cradle movement for substrate transfer Insertion length (flange face to substrate) Deposition height adjustment Not adjustable as standard (see options below) Achievable temperature 1200oC (based on heating a Molybdenum sample) STAGE MOTION OPTIONS 24 V DC motor or Smart Motor or no motor (gearbox only fitted, customer supplies and fits NEMA 23 frame motor) Azimuthal rotation Deposition height...

EpiCentre The Deposition Stage Right-angle Deposition Stages Substrate surface at right angle to mounting flange plane • 2" to 6" substrate diameters • Substrate heating to 1200°C • Continuous azimuthal rotation up to 60rpm • olar rotation (tilt) up to +/- 180° P • DC/RF substrate biasing • X,Y & Z motion options • SiCg or sSiC heater technology • True UHV performance The EC-R provides substrate rotation, tilt, heating and electrical biasing with the substrate surface supported at right angles to the plane of the mounting flange. The base EC-R configuration provides polar rotation to adjust...

Substrate (azimuthal) rotation module Polar rotation (tilt) module The EC-R can be configured to suit your application: Service collar providing power, RF & thermocouple feed throughs LSM64 provides linear displacement EC-R with manual polar rotation (tilt) and manual linear displacement. XY-31 provides lateral translation System mounting flange. EC-R with manual substrate rotation, manual polar rotation (tilt) and manual linear displacement. Shielding to protect mechanism from deposition flux Substrate holder orientated at 90o to mounting flange EC-R with manual substrate rotation, manual...

EpiCentre The Deposition Stage Stage Configuration: EC-R Series STANDARD CONFIGURATION Substrate diameter Polar Rotation Adjustable position HEATING Heater element Silicon Carbide coated graphite (SiCg) as standard (see options below) Achievable temperature 1200°C (based on heating a Molybdenum sample) STAGE MOTION OPTIONS POLAR Rotation Stepper motorised Azimuthal Rotation Manually driven Manual thimble Up to 60rpm (maximum 20rpm recommended with bias) Stepper motorised Up to 60rpm (maximum 20rpm recommended with bias) Z axis Z stroke range offered Resolution manual Resolution stepper...