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Laser Scribing on Ceramics

Laser Scribing on Ceramics

Product catalog summary
Marking Requirements: The document specifies that the scribing depth should be 80μm with a line width of less than 35μm. The edge of the scribing should be smooth with minimal thermal effect.
Marking Matrix: The parameters for the marking process include an F-lens with a focal length of 160 mm, power set at 80%, pulse width of 250ns, and a pulse frequency range of 25 to 80kHz.
Application Result: The document reports that the thermal effect is negligible and can be ignored. The scribing line width is consistent and meets the ideal requirements.
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Catalog excerpts

Laser Scribing on Ceramics-1

Ceramics Scribing Marking Requirements Scribing depth 80μm , line width <35μm, The edge is smooth and almost no thermal effect. Marking Matrix F-lens: f=160 mm Power: 80% Pulse width: 250ns Pulse frequency: 25~80kHz Application result The thermal effect is very little and can be omitted. The scribing line width is uniform & full, which can reach up to idea requirements.

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