Catalog excerpts

M-2000 - 2

Discover the Difference The M-2000® line of spectroscopic ellipsometers is engineered to meet the diverse demands of thin film characterization. An advanced optical design, wide spectral range, and fast data acquisition combine in an extremely powerful and versatile tool. The M-2000 delivers both speed and accuracy. Our patented RCE technology combines Rotating Compensator Ellipsometry with high-speed CCD detection to collect the entire spectrum (hundreds of wavelengths) in a fraction of a second with a wide array of configurations. The M-2000 is the first ellipsometer to truly excel at...

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M-2000 - 3

Thin Film Characterization The M-2000 is most commonly used to measure thin film thickness and optical constants. It is sensitive to less than a monolayer of material (sub-nm) on a surface and yet can determine thickness for transparent films up to tens of microns. The M-2000 can also measure the optical constants (both n and k) from any type of material, whether dielectric, organic, semiconductor, or metal. In addition to optical constants, there are additional material properties that can be indirectly determined based on how they affect changes to a material’s optical response. Film...

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M-2000 - 4

Refractive Index (n) The amplitude of data oscillations is related to the film optical constants. If the film index is closely matched to the substrate index, less light will reflect back to the surface. This is demonstrated for SiO2 film on glass (Figure 3), where index of glass and SiO2 are very similar. When the film and substrate have very different indices, the oscillations can be much larger, as is the case for Ta2O5 on glass (Figure 3). Figure 3. Data from transparent films on glass with different refractive indices. Figure 4. Measurement from an organic dye showing regions where the...

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M-2000 - 5

Applications The M-2000 is a versatile spectroscopic ellipsometer, suited to many different sample types. Coatings can be dielectrics, organics, semiconductors, and even thin metals. Optical Coatings Characterize both thickness and refractive index for single- and multi-layer coatings; anti-reflection, high-reflection, or decorative coatings. Calculate the color coordinates for your coating stack under different lighting conditions. Chemistry/Biology The M-2000 can be used for a variety of chemical and biological applications, either as a stand-alone tool or in combination with one of our...

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M-2000 - 6

Semiconductors Traditional ellipsometry applications are still going strong. Characterize any semiconductor material: resists, photomasks, SiON, ONO stacks, low-k dielectrics, high-k gates, SOI, SiGe, II-VI and III-V ternary and quaternary compounds. SiGe optical constants vs. composition. M-2000 DI Ellipsometer with Automated Angle. Photovoltaics Film thickness and optical properties are critical to performance of solar devices. Ellipsometry is used for development and monitoring of all PV materials: a-Si, µc-Si, poly-Si, AR Coatings (SiNx, AlNx…), TCO Films (ITO, ZnOx, doped SnO2, AZO),...

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M-2000 - 7

Flexible Spectral Range M-2000V 370-1000nm, 390 wavelengths Spectral coverage is ideal for dielectrics, organics, and amorphous semiconductors. Speed, accuracy, and compact optics combine in an affordable package. 245-1000nm, 470 wavelengths Ideal for many thin films: dielectrics, organics, semiconductors, metals, and more. Measure optical constants and thickness for coatings from subnanometer to tens of microns. NIR Option Extend range of any M-2000 193-1000nm, 500 wavelengths Perfect for semiconductor industry requirements. Measure at each lithography line – 193nm, 248nm, and 365nm. Short...

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M-2000 - 8

Flexible Configurations Fixed Angle For many applications, the simplicity and affordability of a fixed angle systems offers great value. Automated Angle Combine flexibility with convenient automation. Available in horizontal or vertical configuration. Vertical system offers wide angle range and flexibility. Independent control of sample and detector angle for diverse reflection or transmission measurements. Horizontal system offers wide range of options like large area mapping, liquid cells, and heat stages.

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M-2000 - 9

Accessories Mapping Map thin film uniformity and other properties. Computer controlled or manual mapping options available. Available in sizes from small samples requiring focused measurements up to large flat panel display glass. Focusing & Camera Add focusing optics to reduce beam diameter. Standard focusing optics are detachable for normal use. Camera option also available to view spot location on sample. Automated Alignment Computer automated tip-tilt and sample height options provide quick, effortless sample alignment. Transmission Transmission accessories are available for horizontal...

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M-2000 - 10

Liquid Studies Add cell with optical windows for measurement through liquid ambient. Monitor the liquid/solid interface in real-time. Temperature-controlled options available. 5mL Heated Liquid Cell (Room Temp. to 50°C) 5mL Horizontal Liquid Cell Temperature Control Add heat stage or cryostat for variable temperature studies. Measure samples at low and elevated temperatures. Variable Temperature Stage (-70°C to 600°C) HTC-100 Heat Stage (Room Temp. to 300°C) Porous Sample Chuck QCM-D Mounting Stage Allows flat mounting of thin plastic substrates. Combine SE and QCM-D measurements to detect...

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M-2000 - 11

Large Panel Mapping The M-2000 is commonly used to map thin film uniformity for large panels used as displays and for photovoltaics. In these industries, measurements of transparent conductive oxides, amorphous and nano-crystalline silicon layers, semiconductor films such as CdTe and CIGS, and oxide and nitride antireflection coatings ensure final device quality. We offer in-line and off-line solutions. Close-up of an In-Line ellipsometer integrated within a conveyor system. (3) In-Line ellipsometer measuring a film through a glass panel. M-2000® for Large Panel Mapping A microcrystalline...

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M-2000 - 12

In Situ The M-2000 is ideal for in-situ monitoring and process control. It is used successfully with many different processes to provide real-time results: • MBE • Plasma etch • Liquid Cell • ALD • Cryostat • PECVD • Sputter • ECR • Heat Stages • E-beam evaporators • MOCVD • PLD Ellipsometry is commonly used in real-time to determine growth or etch rates, measure optical constants with varying process conditions, track index versus temperature to determine transitions in material properties, and monitor adsorption within liquids with sub-monolayer sensitivity. Monitor adsorption within...

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