Overview: The PDS series photoresist dispensing systems are designed to address common issues in the photoresist coating process, such as wasteful use of resist, application variation, contamination, and bubble accumulation. These systems aim to reduce costs and improve production efficiency.
Cost Savings: The system saves 1.5 ml of resist per shot, with 20 applications per wafer and 30,000 wafers produced monthly. This results in an annual saving of 10,800 liters (2,851 gallons) of resist, equating to $1.4 million in cost savings.
Technical Specifications: The system uses a high-torque stepper motor for consistent discharge volume, maintaining a repeatable accuracy of ±0.3% and linearity of ±0.5%. The resolution is 0.01 ml or below.
Contamination Prevention: The tubephragm structure of the
pump minimizes dead volume, preventing particle production and ensuring contamination-free operation.
Versatility: The system can handle various coating processes by adjusting discharge velocity, suitable for small amounts or short application times.
Operational Efficiency: Discharge amount and time are easily set via the controller, reducing operator time and downtime. The system can be mounted on existing equipment without software or signal system changes.
Components: The system includes various controllers and units such as the PDS-210, PDS-230, and PDS-310, each with specific functions like controlling multiple pumps, generating output pulses, and preventing liquid resist dripping.
Construction and Materials: The document includes detailed construction and material specifications, ensuring durability and compatibility with existing systems.
Quality Control: Iwaki's production system emphasizes thorough quality control and efficiency, with facilities like the Iwaki Saitama and Miharu plants contributing to superior production standards.