QUANTUM | SYSTEM Ion & Neutral Deposition Rate Monitor
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QUANTUM | SYSTEMIon & Neutral Deposition Rate Monitor A unique instrument to measure the deposition ratio of ions & neutrals at a surface inside a plasma reactor. Measures • Ion neutral fraction • Deposition rate • Ion energy • Ion flux • Bias voltage Functionality • Time averaged • Time trend Features • Quantum electronics unit • Advanced analytical software suite • Replaceable button probe sensors • Quick start and advanced user modes The Quantum System is an energy resolved gridded quartz crystal microbalance, used to measure the ion neutral fraction at a surface inside a plasma reactor. This cutting edge technology also measures the deposition rate, ion energy, ion flux and bias voltage. The Quantum System is used across industry and research with applications in plasma deposition, coatings, plasma sputtering, PECVD, etching and ion beam. The Quantum System is perfect for users researching plasma recipes, ionization, plasma processes, tool development and fundamental plasma research. www.impedans.com | Tel: +353 1 842 8826 | e-mail: info@impedans.com

IEDF Resolution Crystal Monitor Frequency Range Frequency Resolution Mass Resolution (at crystal) Mass Resolution (at sensor surface) Measurement Update Rate Film Thickness Resolution (Copper) Deposition as a Function of Time showing Flux Fraction RFEA Probe RF Bias Frequency Range Probe Enclosure and Holder Material Aluminium, anodized aluminium, stainless steel* and ceramic (Al2O3)* RFEA Probe Cable Length Total deposition rate versus neutral deposition rate in a plasma deposition chamber Holder Thickness Holder Diameter 4-grids plus Quartz Crystal Button Probe Diameter 650 mm standard...